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US 9,539,033 B2Granted
Lateral spinous process spacer
AssigneeGlobus Medical, Inc.
InventorsJody L. Seifert, Jamie Carroll, David C. Paul, Michael L. Boyer, Jason Zappacosta
Life of this patent
Estimating the term…
Abstract
Interspinous process implants are disclosed. Also disclosed are systems and kits including such implants, methods of inserting such implants, and methods of alleviating pain or discomfort associated with the spinal column.
Claims17
A method for stabilizing the vertebral column comprising:
- accessing an area between adjacent spinous processes;
- positioning an implant between adjacent spinous processes, the implant comprising:
- a cannulated body comprising a support portion extending laterally along a lateral axis between first and second end portions, the body defining a cannula extending therethrough along the lateral axis;
- wherein at least a portion of the first end portion extends beyond the support portion in a direction perpendicular to the lateral axis;
- wherein the device is configured and dimensioned to be inserted between adjacent spinous processes of the vertebral column in a lateral direction along the lateral axis and is advanceable over a guidewire extending through the cannula;
- wherein the first end portion is configured and dimensioned to engage and separate the adjacent spinous processes when inserted and to advance the device in the lateral direction to position the support portion in a predetermined position between the spinous processes;
- wherein the first end portion comprises a generally wedge shape, the wedge shape defining a first cone angle in the lateral direction angled towards a tip of the first end portion and a second cone angle in a vertical direction, angled towards the tip of the first end portion, that is perpendicular or transverse to the lateral axis;
- and
- wherein the first cone angle is greater than the second cone angle;
- and
- rotating the implant from a first configuration to a second configuration relative to the spinous processes, wherein in the first configuration the second end portion has a first height and in the second configuration the second end portion has a second height that is greater than the first height.
8 more elements
A method for implantation in a treated area of an intervertebral space between vertebral bodies of a spine, comprising:
- accessing the treated area of the intervertebral space between vertebral bodies;
- positioning an implant in the treated area, the implant comprising:
- a spacer body comprising a central support portion extending along a lateral axis between first and second end portions,
- the central support portion comprising a superior support surface and an inferior support surface, wherein the superior and inferior support surfaces each have a contact area capable of engaging with anatomy in the treated area and the superior and inferior surfaces are spaced apart a first distraction distance,
- the first end portion comprising a generally wedge shape, the wedge shape having a superior end surface and an inferior end surface, the superior and inferior end surfaces each have a contact area capable of engaging with anatomy in the treated area and the first and second surfaces are spaced apart a second distraction distance, the wedge shape further defining a first cone angle in a lateral direction along the lateral axis angled towards a tip of the first end portion and the wedge shape further defining a second cone angle in a vertical direction, angled towards the tip of the first end portion, that is perpendicular or transverse to the lateral axis, wherein the first cone angle is greater than the second cone angle,
- wherein the first distraction distance is less than the second distraction distance,
- wherein when the device is in a first implantation position the adjacent vertebral bodies are maintained substantially separated by at least the second distraction distance and when the device is in a second implantation position the adjacent vertebral bodies are maintained substantially separated by at least the first distraction distance, and
- wherein the spacer body support portion is laterally advanceable from the first implantation position to the second implantation position;
- and
- rotating the implant from a first configuration to a second configuration relative to the spinous processes, wherein in the first configuration the second end portion has a first height and in the second configuration the second end portion has a second height that is greater than the first height.
7 more elements
Dependencies are inferred from the claim text.