# US 9,521,746 B2 · Conductive film and preparation method thereof > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,521,746 B2 - Document ID: US9521746B2 - Status: Granted - Kind: B2 - Application number: 13/968,745 - Filed: 2013-08-16 - Published: 2015-01-08 - Granted: 2016-12-13 - Earliest claimed: 2013-02-05 - Assignees: Nanchang O-Film Tech. Co., Ltd. - Applicants: Nanchang O-Film Tech. Co., Ltd. - Inventors: Fei Zhou; Sheng Zhang; Yulong Gao - Web page: https://patentgrep.com/patent/US9521746B2 ## CPC - G06F 3/0443: {using a single layer of sensing electrodes} - H05K 1/0274: {Optical details, e.g. printed circuits comprising integral optical means (H05K1/0269 takes precedence; coupling light guides with opto-electronic components G02B6/42)} - H05K 1/03: Use of materials for the substrate - H05K 3/107: {by filling grooves in the support with conductive material (H05K3/045, H05K3/101, H05K3/1258 and H05K3/465 take precedence)} - G06F 2203/04103: Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices - G06F 2203/04112: Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material - G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N) - H05K: PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ## Abstract A conductive film includes a transparent insulating substrate and a conductive mesh formed on the transparent insulating substrate, one of them is imprinted to form a meshed-like grooves on a surface thereof, it is simple and quick, having high efficiency; the grooves is printed and filled with metal slurry and sintered to form a conductive mesh, the cost is low; the distance between the lines of the conductive mesh is defined as d1, 100 μm≦d1<600 μm, the square resistance of the conductive mesh is defined as R, 0.1 Ω/sq≦R<200 Ω/sq. In order to reduce the distance between the line, the width of the mesh line is reduced, thereby improving the light transmission of the conductive film; the smaller the square resistance, the better the conductivity of the conductive film, the faster the transmission speed of the signal; the lower metal content ensure the small square resistance, saving raw materials. ## Claims ### Claim 1 A conductive film, comprising: a transparent insulating substrate and a conductive mesh formed on the transparent insulating substrate; wherein a distance between the lines of the conductive mesh is defined as d1, and follows formula 100 μm≦d1<600 μm, and wherein the lines of the conductive mesh are uniformly arranged so that distance d1 is an equal distance between neighboring lines of the conductive mesh; a square resistance of the conductive mesh is defined as R, and follows formula 0.1 Ω/sq≦R<200 Ω/sq. ### Claim 2 (depends on 1) The conductive film according to claim 1, further comprising a transparent insulating layer formed on a surface of the transparent insulating substrate, wherein the conductive mesh is embedded or buried in the transparent insulating layer. ### Claim 3 (depends on 1) The conductive film according to claim 1, further comprising a transparent insulating layer laid on a surface of the transparent insulating substrate, wherein the transparent insulating layer forms a plurality of intercrossing grooves, the conductive mesh is received in the grooves. ### Claim 4 (depends on 3) The conductive film according to claim 3, wherein the transparent insulating layer is made of one material selected from the group consisting of light curing adhesive, thermosetting adhesive, and self-curing adhesive. ### Claim 5 (depends on 4) The conductive film according to claim 4, wherein the transparent insulating layer is made of one material selected from the group consisting of shadowless adhesive, optical clear adhesive and liquid optical clear adhesive. ### Claim 6 (depends on 3) The conductive film according to claim 3, wherein a thickness of the transparent insulating layer is defined as d4, and a width of the grooves is defined as d3, and follows formula 0.5≦d4/d3≦1.5. ### Claim 7 (depends on 3) The conductive film according to claim 3, wherein the transparent insulating layer is provided with a protective layer on the side thereof defining the grooves for improving the effect of mechanical properties of the transparent insulating layer and preventing the transparent insulating layer from being scratched. ### Claim 8 (depends on 1) The conductive film according to claim 1, wherein the conductive mesh is made of one material selected from the group consisting of gold, silver, copper, aluminum, zinc, and gold silver or an alloy composed of at least two thereof. ### Claim 9 (depends on 8) The conductive film according to claim 8, wherein the conductive mesh is made of silver, and a silver content is 0.7 g/m2 to 1.8 g/m2. ### Claim 10 (depends on 1) The conductive film according to claim 1, wherein the distance between the lines of the conductive mesh is defined as d1, and follows formula 200 μm≦d1<500 μm. ### Claim 11 (depends on 1) The conductive film according to claim 1, wherein the distance defined as d1 follows formula 200 μm≦d1<350 μm. ### Claim 12 (depends on 1) The conductive film according to claim 1, wherein the distance defined as d1 follows formula 350 μm≦d1<500 μm. ### Claim 13 (depends on 1) The conductive film according to claim 1, wherein the square resistance of the conductive mesh is defined as R, and follows formula 0.1 Ω/sq≦R<60 Ω/sq. ### Claim 14 (depends on 1) The conductive film according to claim 1, wherein a width of the line of the mesh of the conductive mesh is defined as d2, and follows formula 1 μm≦d2≦10 μm. ### Claim 15 (depends on 14) The conductive film according to claim 14, wherein the width of the line of the mesh of the conductive mesh is defined as d2, and follows formula 2 μm≦d2≦5 μm. ### Claim 16 (depends on 1) The conductive film according to claim 1, wherein the conductive mesh consists of regular graphics in uniform arrangement. ### Claim 17 (depends on 1) The conductive film according to claim 1, wherein the transparent insulating substrate is made of material selected from the group consisting of polyethylene terephthalate plastic, transparent plastic material, polycarbonate, and glass.