# US 9,519,228 B2 · Substrate holding apparatus and method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,519,228 B2 - Document ID: US9519228B2 - Status: Granted - Kind: B2 - Application number: 13/956,559 - Filed: 2013-08-01 - Published: 2014-10-02 - Granted: 2016-12-13 - Earliest claimed: 2013-04-01 - Assignees: Samsung Display Co., Ltd. - Applicants: Samsung Display Co., Ltd. - Inventors: Sung Hune Yoo - Web page: https://patentgrep.com/patent/US9519228B2 ## CPC - G03F 7/70691: {Handling of masks or workpieces} - G03F 7/707: {Chucks, e.g. chucking or un-chucking operations or structural details} - H10P 72/7612: {characterised by lifting arrangements, e.g. lift pins} - G03F 7/70791: {Large workpieces, e.g. glass substrates for flat panel displays or solar panels} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract Provided are a substrate holding apparatus and a method of using the substrate holding apparatus. According to an aspect of the present invention, there is provided a substrate holding apparatus comprising a stage on which a substrate is placed, and at least one lift bar which separates the substrate from the stage by raising the substrate or placing the substrate on the stage by lowering the substrate. The lift bar comprises a body and a head. The head is connected to an end of the body, contacts the substrate, and is formed of a porous material. ## Claims ### Claim 1 A substrate holding apparatus, comprising: a stage having a major surface disposed to receive a substrate; and at least one lift bar coupled to the stage and configured to move the substrate relative to the major surface of the stage, the lift bar comprising: a body; and a head connected to an end of the body to contact the substrate and formed of a porous material. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein the stage and the head are formed of a same material. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein each of the stage and the head are absent of any through holes. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the stage comprises at least one insertion hole, and the lift bar penetrates the insertion hole, wherein the insertion hole comprises: a first insertion hole which has a shape corresponding to a shape of the body; and a second insertion hole which is connected to the first insertion hole and has a shape corresponding to a shape of the head. ### Claim 5 (depends on 4) The apparatus of claim 4, wherein a line passing through a center of the first insertion hole and a center of the second insertion hole is perpendicular to the major surface of the stage. ### Claim 6 (depends on 4) The apparatus of claim 4, wherein when the head of the lift bar completely fills the second insertion hole, the major surface of the stage and a surface of the head opposite to the body lie in a same plane. ### Claim 7 (depends on 1) The apparatus of claim 1, wherein the body has a first inner space, the first inner space having an open first end that is connected to a first vacuum treatment unit and a first gas supply unit which provide the first inner space a pressure different from atmospheric pressure in response to a first control signal, the inner space having a second and opposite end that is covered by and connected to the head. ### Claim 8 (depends on 1) The apparatus of claim 1, wherein the stage is formed of a porous material. ### Claim 9 (depends on 8) The apparatus of claim 8, further comprising at least one support bar which supports the stage, wherein the support bar has a second inner space having first and second ends opposite to each other, wherein the first end of the second inner space being connected to a second vacuum treatment unit and a second gas supply unit which provide the second inner space a pressure different from atmospheric pressure in response to a second control signal, wherein the second end of the second inner space being connected to and covered by the stage, the vacuum and pressure produced by the second vacuum treatment unit and the second gas supply unit being transmitted to the major surface of the stage via pores within the stage. ### Claim 10 (depends on 9) The apparatus of claim 9, wherein the body has a first inner space, the first inner space having an open first end that is connected to a first vacuum treatment unit and a first gas supply unit which provide the first inner space a pressure different from atmospheric pressure in response to a first control signal, the inner space having a second and opposite open end that connects to the head, the vacuum and pressure produced by the first vacuum treatment unit and the first gas supply unit being transmitted to a surface of the head that contacts the substrate via pores within the head. ### Claim 11 (depends on 10) The apparatus of claim 10, wherein a vacuum suction force generated on the surface of the head that contacts the substrate is equal to a vacuum suction force generated on the major surface of the stage. ### Claim 12 (depends on 1) The apparatus of claim 1, wherein the lift bar is provided in plural form, and the plural lift bars are arranged in a matrix of rows and columns spaced at equal intervals. ### Claim 13 A substrate holding apparatus, comprising: a stage having a major surface disposed to support a substrate; and at least one lift bar coupled to the stage and configured to move the substrate towards and away from the major surface of the stage, the lift bar comprising: a body; and a head connected to an end of the body to control the substrate, the stage and the head formed of a same material, wherein each of the head and the stage being absent of a through hole. ### Claim 14 (depends on 13) The apparatus of claim 13, wherein the stage and the head are formed of a porous material. ### Claim 15 (depends on 14) The apparatus of claim 14, wherein the stage comprises: a first insertion hole having a shape corresponding the body; and a second insertion hole connected to the first insertion hole and having a shape corresponding to the head, the lift bar penetrating the first and second insertion holes, wherein when the head of the lift bar completely fills the second insertion hole, the major surface of the stage and a surface of the head opposite to the body lie in a same plane. ### Claim 16 (depends on 15) The apparatus of claim 15, wherein the lift bar is connected to a first vacuum treatment unit and a first gas supply unit which provide the first inner space a pressure different from atmospheric pressure in response to a first control signal, the pressure being transmitted to the surface of the head opposite the body via pores within the head and not via a through hole, gap or empty space. ### Claim 17 A method for using a substrate holding apparatus, the method comprising: raising a lift bar with respect to a major surface of a stage; placing a substrate on a head of the lift bar, the head formed of a porous material and being absent of any through holes; and lowering the lift bar with respect to the major surface of the stage. ### Claim 18 (depends on 17) The method of claim 17, wherein the stage and the head are formed of the same material. ### Claim 19 (depends on 18) The method of claim 18, further comprising sucking the substrate onto the lift bar by vacuum-treating an inner space of the lift bar after placing the substrate on the head of the raised lift bar, the vacuum in the inner space of the lift bar being transmitted to the substrate via pores in the head and not via a through hole. ### Claim 20 (depends on 18) The method of claim 18, further comprising sucking the substrate onto the stage and the lift bar by vacuum-treating an inner space of a support bar which supports the stage and an inner space of the lift bar when the substrates directly contacts the major surface of the stage, wherein a vacuum suction force generated on a surface of the head that contacts the substrate is equal to a vacuum suction force generated on the major surface of the stage.