# US 9,519,226 B2 · Optical imaging writer system

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- Number: US 9,519,226 B2
- Document ID: US9519226B2
- Status: Granted
- Kind: B2
- Application number: 14/203,168
- Filed: 2014-03-10
- Published: 2014-07-10
- Granted: 2016-12-13
- Earliest claimed: 2008-09-23
- Assignees: Applied Materials, Inc.
- Applicants: Applied Materials, Inc.
- Inventors: Jang Fung Chen; Thomas Laidig
- Web page: https://patentgrep.com/patent/US9519226B2

## CPC

- G03F 7/70383: {Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams (maskless lithography using a programmable mask G03F7/70291)}
- G03F 7/70275: {Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems}
- G03F 7/70291: {Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices}
- G03F 7/70508: {Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus}
- G03F 7/70791: {Large workpieces, e.g. glass substrates for flat panel displays or solar panels}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system comprises a plurality of spatial light modulator (SLM) imaging units, and a controller configured to control the plurality of SLM imaging units. Each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The controller synchronizes movements of the plurality of SLM imaging units with movement of a substrate in writing a mask data to the substrate in a lithography manufacturing process.

## Claims

### Claim 1

A parallel imaging writer system, comprising:
a plurality of spatial light modulator (SLM) imaging units,
wherein each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens, a first camera sensor configured to observe defocus of a substrate on-the-fly, a first motor, a first refractive disk, and a first optical path difference (OPD) modifier, wherein the first camera sensor, the first motor, the first refractive disk, and the first OPD modifier are configured to adjust focus of the first camera sensor to the substrate on-the-fly; and
a controller configured to control the plurality of SLM imaging units, and the controller synchronizes movements of the plurality of SLM imaging units with movement of the substrate in writing a mask data to the substrate in a lithography manufacturing process.

### Claim 2 (depends on 1)

The parallel imaging writer system of claim 1, wherein each SLM imaging unit further comprises:
a second camera sensor, wherein the first and second camera sensors are configured to observe the substrate with complementary focus offsets to determine direction of a target focus.

### Claim 3 (depends on 2)

The parallel imaging writer system of claim 2, wherein each SLM imaging unit further comprises:
a third OPD modifier, wherein the third OPD modifier is configured to adjust focus of the SLM imaging unit to the substrate on-the-fly without changing distance between the one or more projection lenses and the substrate.