# US 9,519,182 B2 · Display panel and method of manufacturing the same

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- Number: US 9,519,182 B2
- Document ID: US9519182B2
- Status: Granted
- Kind: B2
- Application number: 14/644,757
- Filed: 2015-03-11
- Published: 2016-04-28
- Granted: 2016-12-13
- Earliest claimed: 2014-10-27
- Assignees: Samsung Display Co., Ltd.
- Applicants: Samsung Display Co., Ltd.
- Inventors: Jung-Ha Son; Joo-Hyung Lee; Yun-Jong Yeo
- Web page: https://patentgrep.com/patent/US9519182B2

## CPC

- G02F 1/133514: {Colour filters}
- G02F 1/1341: Filling or closing of cells
- G02F 1/134309: {characterised by their geometrical arrangement}
- G02F 1/13439: {characterised by their electrical, optical, physical properties; materials therefor; method of making}
- G02F 1/136209: {Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element}
- G02F 1/136286: {Wiring, e.g. gate line, drain line}
- G02F 1/1368: in which the switching element is a three-electrode device {(G02F1/136277 takes precedence)}
- H10D 86/021: {of multiple TFTs}
- H10D 86/441: {Interconnections, e.g. scanning lines}
- H10D 86/60: wherein the TFTs are in active matrices
- G02F 1/134372: {for fringe field switching [FFS] where the common electrode is not patterned}
- G02F 1/136222: {Colour filters incorporated in the active matrix substrate}
- G02F 2203/10: plasmon
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES

## Abstract

A display panel includes a first substrate comprising a plurality of pixel areas, a second substrate facing the first substrate, a liquid crystal layer interposed between the first substrate and the second substrate, a thin film transistor comprising a gate electrode disposed on the first substrate, a semiconductor pattern overlapping with the gate electrode, a source electrode and a drain electrode overlapping with the semiconductor pattern and spaced apart from each other, a plasmonic color filter to which a common voltage is configured to be applied, and comprising a same material as the gate electrode, disposed on a same layer as the gate electrode, and comprising a plurality of holes through which light is configured to be transmitted and a pixel electrode to which a gray scale voltage is configured to be applied, and overlapping with the plasmonic color filter, and electrically connected to the drain electrode.

## Claims

### Claim 1

A display panel comprising:
a first substrate comprising a plurality of pixel areas;
a second substrate facing the first substrate;
a liquid crystal layer interposed between the first substrate and the second substrate;
a thin film transistor comprising a gate electrode disposed on the first substrate, a semiconductor pattern overlapping with the gate electrode, a source electrode and a drain electrode overlapping with the semiconductor pattern and spaced apart from each other;
a plasmonic color filter to which a common voltage is configured to be applied, and comprising a same material as the gate electrode, disposed directly on a same surface as the gate electrode, and comprising a plurality of holes through which light is configured to be transmitted; and
a pixel electrode to which a gray scale voltage is configured to be applied, and overlapping with the plasmonic color filter, and electrically connected to the drain electrode.

### Claim 2 (depends on 1)

The display panel of claim 1, wherein the gate electrode and the plasmonic color filter comprise at least one of a material selected from the group consisting of copper (Cu), aluminum (Al), molybdenum (Mo), titanium (Ti) and compositions thereof.

### Claim 3 (depends on 1)

The display panel of claim 1, further comprising:
a plurality of gate lines disposed on the first substrate and extending in a first direction; and
a plurality of data lines disposed on the first substrate and extending in a second direction crossing the first direction,
wherein the pixel areas are defined by the gate lines and the data lines, and plasmonic color filters including the plasmonic color filter are disposed on the pixel areas.

### Claim 4 (depends on 3)

The display panel of claim 3, wherein lights configured to be transmitted through adjacent plasmonic color filters have a different wavelength.

### Claim 5 (depends on 4)

The display panel of claim 4, wherein the plasmonic color filters comprise a red plasmonic color filter, a green plasmonic color filter and a blue plasmonic color filter.

### Claim 6 (depends on 5)

The display panel of claim 5, wherein the holes of the red plasmonic color filter have a diameter of more than 220 nm and less than 230 nm, and the holes are spaced apart from each other by more than 500 nm and less than 600 nm.

### Claim 7 (depends on 5)

The display panel of claim 5, wherein the holes of the green plasmonic color filter have a diameter of more than 175 nm and less than 185 nm, and the holes are spaced apart from each other by more than 400 nm and less than 500 nm.

### Claim 8 (depends on 5)

The display panel of claim 5, wherein the holes of the blue plasmonic color filter have a diameter of more than 150 nm and less than 160 nm, and the holes are spaced apart from each other by more than 250 nm and less than 350 nm.

### Claim 9 (depends on 1)

The display panel of claim 1, further comprising:
a first lithium fluoride (LiF) layer disposed on a lower surface of the plasmonic color filter; and
a second LiF layer disposed on an upper surface of the plasmonic color filter.

### Claim 10 (depends on 9)

The display panel of claim 9, wherein a thickness of the first LiF layer and the second LiF layer is less than 1 nm.

### Claim 11 (depends on 1)

The display panel of claim 1, wherein the pixel electrode has a slit pattern.

### Claim 12 (depends on 11)

The display panel of claim 11, further comprising:
a gate insulation layer insulating the gate electrode and the plasmonic color filter; and
a passivation layer covering the source electrode and the drain electrode, and
wherein the pixel electrode is disposed on the passivation layer.

### Claim 13 (depends on 1)

The display panel of claim 1, further comprising:
a black matrix disposed on the second substrate, and overlapping with the thin film transistor.

### Claim 14

A method of manufacturing a display substrate, the method comprising:
forming a metal layer on a first substrate;
forming a photoresist layer on the metal layer;
developing the photoresist layer to form a photo pattern;
etching the metal layer by using the photo pattern as a mask to form a gate electrode and a plasmonic color filter comprising a plurality of holes through which light is configured to be transmitted;
forming a source electrode and a drain electrode on the gate electrode and the plasmonic color filter; and
forming a pixel electrode electrically connected to the drain electrode, and overlapping with the plasmonic color filter.

### Claim 15 (depends on 14)

The method of claim 14, wherein the gate electrode and the plasmonic color filter comprise at least one of a material selected from the group consisting of copper (Cu), aluminum (Al), molybdenum (Mo), titanium (Ti) and compositions thereof.

### Claim 16 (depends on 14)

The method of claim 14, wherein a plurality of gate lines are disposed on the first substrate and extend in a first direction, and a plurality of data lines are disposed on the first substrate and extend in a second direction crossing the first direction,
wherein the pixel areas are defined by the gate lines and the data lines, and plasmonic color filters including the plasmonic color filter are disposed on the pixel areas.

### Claim 17 (depends on 14)

The method of claim 14, further comprising:
forming a first lithium fluoride (LiF) layer on the first substrate before forming the metal layer; and
forming a second LiF layer on an upper surface of the plasmonic color filter.

### Claim 18 (depends on 17)

The method of claim 17, wherein a thickness of the first LiF layer and the second LiF layer is less than 1 nm.

### Claim 19 (depends on 14)

The method of claim 14, further comprising:
forming a gate insulation layer covering the gate electrode and the plasmonic color filter; and
forming a passivation layer covering the source electrode and the drain electrode, and
wherein the pixel electrode is disposed on the passivation layer.

### Claim 20 (depends on 14)

The method of claim 14, further comprising:
forming a black matrix overlapping with a thin film transistor on a second substrate;
providing the second substrate to face the first substrate; and
injecting liquid crystal molecules to a space between the first substrate and the second substrate to form a liquid crystal layer.