# US 9,517,490 B2 · UV irradiation device for clocked operation

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- Number: US 9,517,490 B2
- Document ID: US9517490B2
- Status: Granted
- Kind: B2
- Application number: 14/437,934
- Filed: 2013-10-22
- Published: 2015-12-31
- Granted: 2016-12-13
- Earliest claimed: 2012-10-23
- Assignees: Oerlikon Surface Solutions AG, PfäFfikon
- Applicants: Oerlikon Surface Solutions AG, Trübbach
- Inventors: Carlos Ribeiro; Tasso Karsch; Rüdiger Schäfer; Martin Kaspar
- Web page: https://patentgrep.com/patent/US9517490B2

## CPC

- B05D 3/067: {Curing or cross-linking the coating}
- F26B 3/28: by radiation, e.g. from the sun
- G02B 5/208: {for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation}
- G02B 5/283: {designed for the ultraviolet}
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)
- F26B: DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM (drying devices for combines A01D41/133; racks for drying fruit or vegetables A01F25/12; drying foodstuffs A23; drying hair A45D20/00; body-drying implements A47K10/00; drying household articles A47L; drying gases or vapours B01D; chemical or physical processes for dewatering or like separating liquids from solids B01D43/00; centrifugal apparatus B04; drying ceramics C04B33/30; drying yarns or fabrics in association with some other form of treatment D06C; drying frames for laundry without heating or positive air circulation, domestic laundry-or spin-driers, wringing or hot pressing laundry D06F; furnaces, kilns, ovens F27)
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS

## Abstract

An irradiation device including at least one radiation source, which emits both UV-radiation and W-radiation, i.e. visible light and/or IR radiation. The device includes a transport device for delivering substrates to be irradiated. At least one wavelength-selective filter reflects UV-radiation at an angle of 45° and transmits W-radiation. Means for the absorption of IR radiation are arranged downstream of the optical filter in the propagation direction in the beam path of the W-radiation not deflected by the wavelength-selective filter. The means for the absorption of IR radiation are also designed to absorb visible light and UV rays, and the irradiation device includes movement means in order to guide the wavelength-selective filter into and out of the beam path of the radiation source.

## Claims

### Claim 1

Irradiation apparatus with
at least one radiation source, which emits UV-radiation as well as W-radiation, i.e. visible light and/or IR-radiation and,
a transport arrangement for feeding substrates to be irradiated, and
at least one wave-length selective filter, which reflects the UV-radiation and transmits W-radiation about an angle of 45°,
means for absorbing of IR-radiation, located downstream of the optical filter, as considered in direction of propagation, in the ray-path of the W-radiation, not deflected by the wave-length selective filter,
characterized by that the means for absorbing of IR-radiation are also tailored as means absorbing visible light and a predominant part of UV-radiation, and that the irradiation apparatus comprises moving means for moving the wave-length selective filter into and completely out of the ray-path of the radiation source.

### Claim 2 (depends on 1)

Irradiation apparatus according to claim 1, characterized by that the moving means allow for a rotation of the filter about an axis, which is located outside the ray-path.

### Claim 3 (depends on 1)

Irradiation apparatus according to claim 1, characterized by that the wave-length selective filter is tailored as an interference filter.

### Claim 4 (depends on 1)

Irradiation apparatus according to claim 1, characterized by that only on one side of the filter substrate a UV reflecting layer system is provided.

### Claim 5 (depends on 4)

Irradiation apparatus according to claim 4, characterized by that there is applied on the other side of the filter substrate an anti-reflex layer for the W-radiation.

### Claim 6

A method for irradiating substrates by UV-radiation, comprising the steps of:
providing a radiation source, which emits UV-radiation and W-radiation,
separation of the UV-radiation from the W-radiation by means of transmission of the W-radiation through a wave-length selective filter and reflection of UV-radiation at the wave-length selective filter,
providing absorption means, which absorb radiation not deflected by the wave-length selective filter,
feeding the substrates into the area provided for the UV-irradiation,
removal of the substrates having been irradiated by the UV-radiation,
characterized by that, before the feeding and/or the removal of the substrates, the wave-length selective filter is changed with respect to its local orientation and/or position in a manner that during the feeding and/or the removal of the substrates, the UV-radiation is not reflected by the wave-length selective filter and thus impinges on the absorption means and is absorbed by these means.

### Claim 7 (depends on 6)

The method according to claim 6, characterized by that the filter is substantially moved out of the ray-path during the feeding and/or the removal of the substrates.

### Claim 8 (depends on 7)

The method of claim 7, characterized by that the filter is moved out of the ray-path by a rotation about an axis located outside the ray-path.

### Claim 9 (depends on 6)

The method according to claim 6, characterized by that the method is operated more than once and in a clocked manner.