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US 9,511,469 B2Granted
Polishing assembly and method for polishing using a platform and barrier in a tumbling process
AssigneePratt & Whitney Services Pte Ltd.
InventorsChua Boon Beng, Thomas Tan, Kim Wei Cheah, Wai Tuck Chow
Life of this patent
Estimating the term…
Abstract
An example component polishing method includes polishing a component protecting portions of the component during the polishing using a barrier spaced from the component. The barrier is configured to move together with the component during the polishing.
Claims17
A component polishing method, comprising:
- polishing a component;
- protecting portions of the component during the polishing using a barrier spaced from the component, wherein the barrier is configured to move together with the component during the polishing;
- holding the component and the barrier within a fixture during the polishing in one of a plurality of possible fixed positions, the component and the barrier selectively adjustable together relative to the fixture to the plurality of possible fixed positions within the fixture;
- and
- prior to the polishing, adjusting the component and the barrier together relative to the fixture from the one of the plurality of possible fixed positions to another of the plurality of possible fixed positions, the adjusting changing how a media interfaces with the component and the barrier during the polishing,
- wherein the barrier and the component move together relative to the fixture during the adjusting.
3 more elements
a base structure of a polishing assembly, comprising:
- a platform configured to engage a component;
- a barrier extending from the platform, the barrier spaced from the component when the platform engages the component, the barrier configured to move together with the component during a polishing process, wherein the platform is held within a support , and a position of the platform and the barrier relative to the support is selected from one of a plurality of possible fixed positions, the plurality of possible fixed positions defined by the platform , the support, or both, wherein a pin associated with each platform is received within one of a plurality of apertures to limit rotation of the barrier and the platform relative to the support, the plurality of apertures providing the plurality of possible fixed positions.
A polishing component, comprising:
- A component having first surfaces and second surfaces, wherein the first surfaces were directly contacted by media during a polishing and a barrier extending from a platform held in a fixture was spaced from the second surfaces to limit contact between the media and the second surfaces during the polishing, wherein the component and the barrier were held within the fixture during the polishing, and wherein the component and the barrier are adjustable together relative to the fixture to one of a plurality of fixed positions, wherein a pin associated with each platform is received within one of a plurality of apertures to limit rotation of the barrier and the platform relative to the fixture, the plurality of apertures providing the plurality of possible fixed positions.
Dependencies are inferred from the claim text.