Antireflection film, polarizing plate, image display device and a manufacturing method for antireflection film
AssigneeFUJIFILM Corporation
InventorsShuntaro Ibuki, Nobuyuki Akutagawa, Miho Asahi
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Abstract
There is provided an antireflection film having a surface haze of less than 1.0%, including: a light transmitting layer; and an antireflection layer, wherein the antireflection layer includes a specific unevenness structure on a surface at a side opposite to a side at which the light transmitting layer is provided, the specific unevenness structure made from specific raw materials.
Claims15
An antireflection film, comprising:
- a light transmitting layer;
- and
- an antireflection layer,
- wherein the antireflection layer includes an unevenness structure on a surface at a side opposite to a side at which the light transmitting layer is provided,
- the unevenness structure includes a phase separation structure in a sea-island form,
- the phase separation structure in the sea-island form includes:
- a sea part containing a cured product of an ionizing radiation curable monomer A including two or more polymerizable groups in a molecule;
- and
- an island part containing an ionizing radiation curable polymer B including two or more polymerizable groups, and having a SP value lower by 0.5 or more than the ionizing radiation curable monomer A, a viscosity larger by 100 mPa·s than the ionizing radiation curable monomer A and a mass average molecular weight of 1000 or more,
- the island part protrudes from the sea part to be a convex portion in the unevenness structure,
- an area ratio of the sea part to the island part at an outermost surface of the antireflection layer is 1.0 or more,
- a size of the island part which is the convex portion, and a period of a distance between convex portions adjacent to each other are 380 nm or less, and
- a surface haze of the antireflection film is less than 1.0%.
A manufacturing method for an antireflection film including a light transmitting layer and an antireflection layer, wherein the antireflection layer includes an unevenness structure on a surface at a side opposite to a side at which the light transmitting layer is provided, the method comprising:
- applying, above the light transmitting layer, a composition containing:
- an ionizing radiation curable monomer A including two or more polymerizable groups in a molecule;
- an ionizing radiation curable polymer B including two or more polymerizable groups, and having a SP value lower by 0.5 or more than the ionizing radiation curable monomer A, a viscosity larger by 100 mPa·s than the ionizing radiation curable monomer A and a mass average molecular weight of 1000 or more;
- a polymerization initiator C;
- and
- a solvent permeable into the light transmitting or an underlayer;
- phase-separating the ionizing radiation curable monomer A and the ionizing radiation curable polymer B in a sea-island form;
- permeating a part of the ionizing radiation curable monomer A into the light transmitting layer or the underlayer;
- and
- curing the ionizing radiation curable monomer A and the ionizing radiation curable polymer B to form an antireflection layer having a phase separation structure in the sea-island form including a sea part constituted by a cured product of the ionizing radiation curable monomer A and an island part constituted by a cured product of the ionizing radiation curable polymer B and protruding from the sea part to be a convex portion,
- wherein an area ratio of the sea part to the island part at an outermost surface of the antireflection layer is 1.0 or more, and
- a size of the island part which is the convex portion, and a period of a distance between convex portions adjacent to each other are 380 nm or less, and
- a surface haze of the antireflection film is less than 1.0%.
Dependencies are inferred from the claim text.