Combinatorial methods for developing electrochromic materials and devices
AssigneeIntermolecular, Inc.
InventorsJeroen Van Duren, Minh Huu Le, Minh Anh Nguyen, Sandeep Nijhawan
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Abstract
A substrate having a plurality of site-isolated regions defined thereon is provided. A first electrochromic material, or a first electrochromic device stack, is formed above a first of the plurality of site-isolated regions using a first set of processing conditions. A second electrochromic material, or a second electrochromic device stack, is formed above a second of the plurality of site-isolated regions using a second set of processing conditions. The second set of processing conditions is different than the first set of processing conditions.
Claims11
A method comprising:
- providing a substrate, wherein the substrate has a plurality of site-isolated regions (SIRs) defined thereon;
- forming a first electrochromic material above a surface of a first of the plurality of SIRs using a first set of processing conditions;
- and
- forming a second electrochromic material above a surface of a second of the plurality of SIRs using a second set of processing conditions,
- wherein the second set of processing conditions is different than the first set of processing conditions, the processing conditions are varied in a combinatorial manner, and each of the first set of processing conditions and the second set of processing conditions comprises at least one of a chemical composition of the respective electrochromic material, a thickness of the respective electrochromic material, a temperature at which the respective electrochromic material is formed, and a processing condition associated with a gaseous environment within a processing chamber in which the respective electrochromic material is formed.
A method for evaluating electrochromic material processing conditions, the method comprising:
- positioning a substrate in a processing chamber, the substrate having a plurality of site-isolated regions (SIRs) defined thereon;
- forming a first electrochromic material above a surface of a first of the plurality of SIRs using a first set of processing conditions;
- after the forming of the first electrochromic material above the surface of the first of the plurality of SIRs, moving the substrate within the processing chamber in a direction parallel to the surface of the first of the plurality of SIRs;
- and
- after the moving of the substrate within the processing chamber, forming a second electrochromic material above a surface of a second of the plurality of SIRs within the processing chamber using a second set of processing conditions,
- wherein the second set of processing conditions is different than the first set of processing conditions, the processing conditions are varied in a combinatorial manner, and each of the first set of processing conditions and the second set of processing conditions comprises at least one of a chemical composition of the respective electrochromic material, a thickness of the respective electrochromic material, a temperature at which the respective electrochromic material is formed, and a processing condition associated with a gaseous environment within the processing chamber during the forming of the respective electrochromic material.
Dependencies are inferred from the claim text.