Method and device for producing a low-emissivity layer system

A method for producing a low-emissivity layer system, comprising the steps of:

• forming at least one transparent metallic IR reflection layer on at least one side of a substrate by deposition, and subsequently tempering the at least one transparent metallic IR reflection layer by rapid thermal processing (RTP) with electromagnetic radiation having an emission wavelength range encompassing a range of absorption maxima of the at least one transparent metallic IR reflection layer without heating of the substrate, wherein the electromagnetic radiation is set to achieve a predefined final temperature of the at least one transparent metallic IR reflection layer which anneals structural defects in the at least one transparent metallic IR reflection layer without damaging the at least one transparent metallic IR reflection layer, wherein the electromagnetic radiation is effected by a flash lamp arrangement having at least one flash lamp by at least one flash pulse and wherein the tempering decreases sheet resistance and heat emissivity, and increases transmission in the visible range and reflection of infrared by the at least one transparent metallic IR reflection layer.