# US 9,437,663 B2 · Array substrate and fabrication method thereof, and display device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,437,663 B2 - Document ID: US9437663B2 - Status: Granted - Kind: B2 - Application number: 14/785,905 - Filed: 2015-03-18 - Published: 2016-06-30 - Granted: 2016-09-06 - Earliest claimed: 2014-11-17 - Assignees: Boe Technology Group Co., Ltd. - Applicants: Boe Technology Group Co., Ltd. - Inventors: Jiangbo Chen; Jun Cheng; Chunsheng Jiang; Baoxia Zhang - Web page: https://patentgrep.com/patent/US9437663B2 ## CPC - H10D 86/421: {having a particular composition, shape or crystalline structure of the active layer} - H10D 30/6755: {Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate} - H10D 62/80: characterised by the materials - H10D 86/423: {comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO} - H10D 86/60: wherein the TFTs are in active matrices - H10D 99/00: Subject matter not provided for in other groups of this subclass - H10K 59/1213: {the pixel elements being TFTs} - H10K 59/126: Shielding, e.g. light-blocking means over the TFTs - H10K 59/38: comprising colour filters or colour changing media [CCM] - H10K 59/875: {Arrangements for extracting light from the devices} - H10K 59/8792: {comprising light absorbing layers, e.g. black layers} - H10K 59/1201: {Manufacture or treatment} - H10K 2102/00: Constructional details relating to the organic devices covered by this subclass - H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES - H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES ## Abstract An array substrate and a fabrication method thereof, and a display device are provided. The array substrate comprises: a pattern of an organic light-emitting layer (11); a pattern of an active layer (4a) located in a thin film transistor region and a pattern of an absorbing layer (4b) located in an open region, which are arranged in a same layer, wherein, the pattern of the absorbing layer (4b) is located in a light outgoing direction of the pattern of the organic light-emitting layer (11), and is made of a transparent material having an ultraviolet absorbing function. In this way, the pattern of the absorbing layer located in the open region can absorb ultraviolet light from outgoing light, so that damage to eyes caused by the outgoing light can be reduced; and the pattern of the active layer and the pattern of the absorbing layer are arranged in a same layer, which, as compared with a manner of separately arranging a layer of an ultraviolet absorbing layer in the array substrate, can reduce a thickness of the array substrate, which is conducive to lighting and thinning a display device. ## Claims ### Claim 1 An array substrate, comprising: a pattern of an organic light-emitting layer; a pattern of an active layer located in a thin film transistor region and a pattern of an absorbing layer located in an open region, arranged in a same layer, wherein, the pattern of the absorbing layer is located in a light outgoing direction of the pattern of the organic light-emitting layer, and is made of a transparent material having an ultraviolet absorbing function. ### Claim 2 (depends on 1) The array substrate according to claim 1, wherein the transparent material is an indium gallium zinc oxide. ### Claim 3 (depends on 1) The array substrate according to claim 1, wherein the pattern of the organic light-emitting layer is configured to emit white light. ### Claim 4 (depends on 1) The array substrate according to claim 1, wherein the pattern of the organic light-emitting layer is configured to emitting colored light. ### Claim 5 (depends on 1) The array substrate according to claim 1, wherein the pattern of the active layer is made of material which is a same as that of the pattern of the absorbing layer. ### Claim 6 (depends on 3) The array substrate according to claim 3, wherein the array substrate further comprises a pattern of a color filter layer located in the light outgoing direction of the pattern of the organic light-emitting layer. ### Claim 7 (depends on 1) A display device, comprising the array substrate according to claim 1. ### Claim 8 (depends on 2) A display device, comprising the array substrate according to claim 2. ### Claim 9 (depends on 3) A display device, comprising the array substrate according to claim 3. ### Claim 10 (depends on 4) A display device, comprising the array substrate according to claim 4. ### Claim 11 (depends on 5) A display device, comprising the array substrate according to claim 5. ### Claim 12 (depends on 6) A display device, comprising the array substrate according to claim 6. ### Claim 13 A fabrication method of an array substrate, comprising: forming a pattern of an active layer located in a thin film transistor region and a pattern of an absorbing layer located in an open region in a same layer, the pattern of the absorbing layer being made of a transparent material having an ultraviolet absorbing function; forming a pattern of an organic light-emitting layer, wherein the pattern of the absorbing layer is arranged in a light outgoing direction of the pattern of the organic light-emitting layer. ### Claim 14 (depends on 13) The fabrication method according to claim 13, wherein the transparent material is an indium gallium zinc oxide. ### Claim 15 (depends on 13) The fabrication method according to claim 13, wherein the forming a pattern of an organic light-emitting layer comprises: forming the pattern of the organic light-emitting layer by using a method of evaporating or printing. ### Claim 16 (depends on 13) The fabrication method according to claim 13, wherein the pattern of the organic light-emitting layer is configured to emit white light. ### Claim 17 (depends on 16) The fabrication method according to claim 16, the method further comprises: forming a pattern of a color filter layer located in the light outgoing direction of the pattern of the organic light-emitting layer. ### Claim 18 (depends on 13) The fabrication method according to claim 13, wherein the pattern of the organic light-emitting layer is configured to emit colored light. ### Claim 19 (depends on 13) The fabrication method according to claim 13, wherein the forming a pattern of an active layer located in a thin film transistor region and a pattern of an absorbing layer located in an open region in a same layer comprises: forming a pattern of an active layer located in a thin film transistor region and a pattern of an absorbing layer located in an open region in a same layer by using a same material and a same process.