# US 9,437,414 B2 · Pattern forming device and semiconductor device manufacturing method

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- Number: US 9,437,414 B2
- Document ID: US9437414B2
- Status: Granted
- Kind: B2
- Application number: 13/607,276
- Filed: 2012-09-07
- Published: 2013-08-29
- Granted: 2016-09-06
- Earliest claimed: 2012-02-29
- Assignees: Kabushiki Kaisha Toshiba
- Applicants: Takumi Ota
- Inventors: Takumi Ota
- Web page: https://patentgrep.com/patent/US9437414B2

## CPC

- H10P 95/00: Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
- B29C 33/30: Mounting, exchanging or centering {(moulds, mould parts or cores; B29C33/485 takes precedence)}
- B29C 43/021: {characterised by the shape of the surface}
- B29C 43/18: incorporating preformed parts or layers, e.g. compression moulding around inserts or for coating articles {(B29C43/206 takes precedence)}
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- B29C 2035/0827: {using UV radiation}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A pattern forming device uses a template having a plurality of protrusions and recesses configured to imprint a reverse image thereof on a resin on a substrate. The pattern forming device has a holding part, a stage, a driving part, and a curing part. The holding part includes a contact portion having a friction reducing contact portion, which is configured to engage against the template to hold the template. The stage carries the substrate. The driving part is configured to move at least one of the holding part and the stage to have the pattern in contact with the resin. The curing part cures the resin. The contact portion has a main body portion configured to move forward/backward with respect to the template and a tip portion arranged on the main body portion.

## Claims

### Claim 1

A pattern forming device, which uses a template having a body with side surfaces, and a pattern arranged on a major surface of the body and having a plurality of depressions and a plurality of protrusions formed thereon to map the shape of the pattern to a resin on a substrate, the pattern forming device comprising:
a holding portion configured to hold the body and being positionable adjacent to a major surface of the body opposite the major surface having the pattern, the holding portion having at least two independently moveable contact portions that are positioned and arranged to engage a side surface of the template through a contact friction reducing film, each of the at least two independently moveable contact portions has at least two protruding portions separated by a gap there between, and the at least two independently moveable contact portions are each coupled to an actuator, and the actuators move the at least two independently moveable contact portions relative to the body.

### Claim 2 (depends on 1)

The pattern forming device of claim 1, wherein the actuator comprises a piezoelectric actuator.

### Claim 3 (depends on 1)

The pattern forming device of claim 1, wherein the at least two protruding portions comprise a plurality of protrusions arrayed symmetrically.

### Claim 4 (depends on 3)

The pattern forming device of claim 3, wherein the side surface of the template includes at least one recess into which one of the at least two protruding portions may be received during engagement of the at least two independently moveable contact portions and the template.

### Claim 5 (depends on 1)

The pattern forming device of claim 1, wherein the contact friction reducing portion film comprises a fluororesin film formed thereon.