# US 9,437,399 B2 · Plasma equipment > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,437,399 B2 - Document ID: US9437399B2 - Status: Granted - Kind: B2 - Application number: 14/400,306 - Filed: 2013-05-16 - Published: 2015-04-09 - Granted: 2016-09-06 - Earliest claimed: 2012-05-17 - Assignees: Industry-University Cooperation Foundation Hanyang University - Applicants: Industry-University Cooperation Foundation Hanyang University - Inventors: Chin-Wook Chung; Jin-Young Bang; Hee-Jin Lee - Web page: https://patentgrep.com/patent/US9437399B2 ## CPC - H01J 37/3211: {Antennas, e.g. particular shapes of coils} - H01F 38/14: Inductive couplings - H01J 37/32183: {Matching circuits} - H05H 1/46: using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) - H01J 2237/327: Arrangements for generating the plasma - H05H 1/4652: {using inductive coupling means, e.g. coils} - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H01F: MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES - H05H: PLASMA TECHNIQUE (apparatus or processes specially adapted for producing X-rays H05G2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS ## Abstract There is provided plasma equipment including a power supply that supplies a RF power; a chamber in which plasma is generated, and a processing target to processed by the plasma is provided; an antenna coil that is provided on a top surface of the chamber, and is connected to the power supply to receive the RF power; and a resonance coil that is provided to be electrically insulated or cut off from the antenna coil. The resonance coil receives electromagnetic energy applied from the antenna coil to allow a current to flow, and the plasma is generated within the chamber. It is possible to increase the degree of freedom for an installation position of the resonance coil, and it is possible to increase plasma density. ## Claims ### Claim 1 Plasma equipment comprising: a power supply that supplies a RF power; a chamber configured to generate plasma and process a processing target by using the plasma; an antenna coil that is provided on a top surface of the chamber, and is directly connected to the power supply to receive the RF power; a resonance coil that is provided to be electrically insulated or separated from the antenna coil and provided to be not connected to the antenna coil and the power supply; and a variable capacitor that is connected to the resonance coil in parallel so as to allow the resonance coil to cause an electromagnetic inductive resonance, wherein the resonance coil receives electromagnetic energy from the antenna coil in a wireless power transmitting manner by the electromagnetic inductive resonance to allow a current to flow, and the plasma is generated within the chamber, and the current flowing in the resonance coil that wirelessly receives the power from the antenna coil to cause the resonance may be varied by adjusting a size of the variable capacitor, and the plasma generated within the chamber can be controlled by adjusting the size of the variable capacitor. ### Claim 2 (depends on 1) The plasma equipment of claim 1, wherein the resonance coil is provided at least two on the top surface of the chamber, and the antenna coil is positioned between the resonance coils. ### Claim 3 (depends on 1) The plasma equipment of claim 1, wherein an auxiliary coil is provided on the top surface of the chamber and is provided to be separated from the antenna coil and the resonance coil, and the resonance coil is provided above the antenna coil so as to be spaced apart from the top surface of the chamber, and the resonance coil is provided above the auxiliary coil, and the variable capacitor is not connected to the auxiliary coil. ### Claim 4 (depends on 3) The plasma equipment of claim 3, wherein the auxiliary coil is formed in the same shape with the resonance coil and allows the current flowing in the resonance coil to be uniform, and a wireless power transmission by the electromagnetic inductive resonance is not performed between the antenna coil and the auxiliary coil or between the resonance coil and the auxiliary coil. ### Claim 5 (depends on 1) The plasma equipment of claim 1, wherein a plurality of the resonance coil and the variable capacitor are provided, and each variable capacitor is connected to each resonance coil, and same number of the variable capacitor is connected to each resonance coil. ### Claim 6 (depends on 5) The plasma equipment of claim 5, wherein the plurality of the variable capacitor are positioned at the same radius with respect to a center of the top surface of the chamber. ### Claim 7 (depends on 6) The plasma equipment of claim 6, wherein the current flowing in the resonance coil is varied depending on a value of the variable capacitor. ### Claim 8 (depends on 7) The plasma equipment of claim 7, wherein the resonance coil and the variable capacitor connected in parallel is formed in a closed curved-line shape as a whole. ### Claim 9 (depends on 7) The plasma equipment of claim 7, wherein the variable capacitor is respectively connected to the resonance coil in parallel. ### Claim 10 (depends on 5) The plasma equipment of claim 5, wherein the resonance coil includes a ferritic material, or is made of the ferritic material in order to change a frequency of the resonance coil and to increase a Q-factor. ### Claim 11 (depends on 1) The plasma equipment of claim 1, wherein the resonance coil comes in contact with an outer surface of a top of the chamber, and is formed in a plurality of ring shapes having the same center. ### Claim 12 (depends on 1) The plasma equipment of claim 1, wherein a frequency of the power supply may be changed according to a frequency of the resonance coil in order to control the plasma.