# US 9,437,395 B2 · Method and compound system for inspecting and reviewing defects > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,437,395 B2 - Document ID: US9437395B2 - Status: Granted - Kind: B2 - Application number: 14/964,316 - Filed: 2015-12-09 - Published: 2016-06-09 - Granted: 2016-09-06 - Earliest claimed: 2014-12-09 - Assignees: Hermes Microvision, Inc. - Applicants: Hermes Microvision Inc. - Inventors: Shuai Li - Web page: https://patentgrep.com/patent/US9437395B2 ## CPC - H01J 37/28: with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} - H01J 37/04: Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement {(H01J37/32009, H01J37/32623, H01J37/3266, H01J37/32697 take precedence; electron or ion-optical systems for localised treatment of objects H01J37/3007)} - H01J 37/05: Electron or ion-optical arrangements for separating electrons or ions according to their energy {or mass}(particle separator tubes H01J49/00) - H01J 37/222: {Image processing arrangements associated with the tube} - H01J 37/265: {Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination} - H01J 37/285: Emission microscopes, e.g. field-emission microscopes - H01J 2237/2449: Detector devices with moving charges in electric or magnetic fields - H01J 2237/2817: Pattern inspection - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract The present invention provides an improved electron-optical apparatus for the inspection and review of the specimen, and for the defect inspection, an inspection mode of operation is performed to generate inspection data, wherein the large beam current is formed by a magnetic immersion lens to scan the specimen, and preferably the objective lens system, a swing objective retarding immersion lens, focuses the beam current and generates the large scanning field, and for the defect review, the review mode of operation is performed to analyze the defects, wherein the large beam current is abandoned and the small beam current is adopted to examine the specimen without a large scanning field, and in order to properly select and detect signal charged particles excited from the specimen, a first Wien filter is utilized to select the acquired signal particles and a second Wien filter is used to compensate the aberrations induced when the signal particles pass through the first Wien filter. ## Claims ### Claim 1 A charged particle beam apparatus, comprising: a charged particle source for generating a beam current; an immersion condenser lens for an inspection mode of operation; a non-immersion condenser lens below the charged particle source for a review mode of operation; an objective lens for focusing the beam current onto a specimen; a first electron optical element in the objective lens to deflect signal charged particles emanated from the specimen; a second electron optical element to compensate aberrations generated when the signal charged particles pass through the first electron optical element; and a detector system with multi-channels for detecting the signal charged particles. ### Claim 2 (depends on 1) The charged particle beam apparatus of claim 1, wherein the immersion condenser lens is turned on in the inspection mode of operation and the immersion condenser lens is turned off in the review mode of operation. ### Claim 3 (depends on 1) The charged particle beam apparatus of claim 1 further comprising a first beam aperture for the inspection mode of operation is disposed closed to the charged particle source. ### Claim 4 (depends on 1) The charged particle beam apparatus of claim 1 further comprising a second beam aperture for the review mode of operation is disposed below the non-immersion condenser lens. ### Claim 5 (depends on 1) The charged particle beam apparatus of claim 1 further comprising a scanning deflection coil. ### Claim 6 (depends on 1) The charged particle beam apparatus of claim 1, wherein the first electron optical element with an electromagnetic multi-pole is below the detector system and makes a dipole field to select the signal charged particles for the inspection mode of operation and a quadrupole field to select the signal charged particles with different emission azimuth angles for the review mode of operation. ### Claim 7 (depends on 1) The charged particle beam apparatus of claim 1, wherein the second electron optical element with an electromagnetic multi-pole is above the detector system and makes a dipole or quadrupole field to compensate the aberrations. ### Claim 8 (depends on 1) The charged particle beam apparatus of claim 1, wherein the first and second electron optical elements are Wien filters or ExB filters. ### Claim 9 An apparatus for inspection and/or review of a specimen, comprising: a charged particle source for generating a beam current; a magnetic immersion condenser lens; a magnetic non-immersion condenser lens; an objective lens system, comprising: a compound objective lens; a first deflection system for deflecting and positioning the beam current on the specimen; a second deflection system for deflecting the beam current to scan the specimen; and a detector with at least one channel to detect signal charged particles emanated from the specimen; wherein the inspection of the specimen is performed while the magnetic immersion condenser lens is turned on; and wherein the review of the specimen is performed while the magnetic immersion condenser lens and the first deflection system are turned off. ### Claim 10 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9 further comprising a first beam aperture for the inspection mode of operation is disposed closed to the charged particle source. ### Claim 11 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9 further comprising a second beam aperture for the review mode of operation is disposed below the non-immersion condenser lens. ### Claim 12 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9, wherein the compound objective lens, the first and second deflection systems form a swing objective retarding immersion lens. ### Claim 13 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9, wherein the first deflection system comprises a plurality of deflectors arranged within the compound objective lens and along an optical axis, and at least one of the deflectors is located in a retarding field of a retardation electrode for generating a swing objective lens axis. ### Claim 14 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9, wherein the second deflection system comprises a plurality of defectors arranged along the optical axis. ### Claim 15 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9 further comprising a first Wien filter is below the detector and makes a dipole field to select the signal charged particles for the inspection mode of operation and a quadrupole field to select the signal charged particles with different emission azimuth angles for the review mode of operation. ### Claim 16 (depends on 15) The apparatus for inspection and/or review of a specimen of claim 15 further comprising a second Wien filter is above the detector and makes a dipole or quadrupole field to compensate aberrations generated when the signal charged particles pass through the first Wien filter. ### Claim 17 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9, wherein the compound objective lens comprises an immersion magnetic lens and an electrostatic lens for focusing the beam current. ### Claim 18 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9, wherein the first deflection system has a large scanning deflective sensitivity for a large scanning field. ### Claim 19 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9, wherein the second deflection system has a small scanning deflective sensitivity for a small scanning field. ### Claim 20 (depends on 9) The apparatus for inspection and/or review of a specimen of claim 9, wherein the first deflection system is turned off and grounded for the review of the specimen and the second deflection system is turned off and grounded while the first deflection system is performing for the inspection of the specimen. ### Claim 21 A method for inspection and review of a specimen, comprising: inspecting the specimen in an apparatus to position defect locations; and reviewing the defect locations; wherein the inspecting is performed in an inspection mode of operation while a magnetic immersion condenser lens is turned on; and wherein the reviewing is performed in a review mode of operation while a magnetic immersion condenser lens and a first deflection system are turned off.