# US 9,436,101 B2 · Optical arrangement and microlithographic projection exposure apparatus including same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,436,101 B2 - Document ID: US9436101B2 - Status: Granted - Kind: B2 - Application number: 13/407,466 - Filed: 2012-02-28 - Published: 2012-07-19 - Granted: 2016-09-06 - Earliest claimed: 2009-09-30 - Assignees: Carl Zeiss SMT GmbH - Applicants: Armin Schoeppach; Hans-Juergen Mann; Frank Eisert; Yim-Bun Patrick Kwan - Inventors: Armin Schoeppach; Hans-Juergen Mann; Frank Eisert; Yim-Bun Patrick Kwan - Web page: https://patentgrep.com/patent/US9436101B2 ## CPC - G03F 7/70825: {Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707)} - G02B 17/0657: {off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS ## Abstract An optical arrangement includes at least one optical element and a support element for the optical element. The optical element and the support element are connected together by way of at least three decoupling elements. The decoupling elements are formed monolithically with the optical element and with the support element. ## Claims ### Claim 1 An optical arrangement, comprising: an optical element having outer circumference in a plane that extends in a radial direction of the optical element; a support element in the plane, the support element being outside of the outer circumference of the optical element in the plane; and at least three decoupling elements connecting the optical element and the support element, wherein: the optical element, the support element and the at least three decoupling elements are monolithic; the optical element has a ratio of a maximum diameter to a maximum thickness of at least 10; a natural frequency of the optical arrangement is at least 250 Hz; and the optical arrangement is configured to be used in a microlithographic projection exposure apparatus. ### Claim 2 (depends on 1) The optical arrangement as set forth in claim 1, further comprising mounting elements displaced in a peripheral direction with respect to the decoupling elements, wherein the support element is connectable to a carrier structure of the microlithographic projection exposure apparatus via the mounting elements. ### Claim 3 (depends on 2) The optical arrangement of claim 2, wherein the mounting elements are spaced from each other at a substantially constant distance relative to the decoupling elements in the peripheral direction. ### Claim 4 (depends on 2) The optical arrangement of claim 2, wherein the mounting elements are displaced from each other in a peripheral direction through an angle of 60°±20° relative to the decoupling elements. ### Claim 5 (depends on 2) The optical arrangement of claim 2, wherein the mounting elements are configured to provide a statically defined mounting for the optical element. ### Claim 6 (depends on 2) The arrangement of claim 2, wherein, in the radial direction, the at least three decoupling elements are between the support element and the outer circumference of the optical element. ### Claim 7 (depends on 1) The optical arrangement of claim 1, wherein the decoupling elements are spaced from each other at a substantially constant distance in a peripheral direction. ### Claim 8 (depends on 1) The optical arrangement of claim 1, wherein the decoupling elements are displaced from each other in a peripheral direction through an angle of 120°±30°. ### Claim 9 (depends on 1) The optical arrangement of claim 1, wherein the support element is connected to the optical element via precisely three decoupling elements. ### Claim 10 (depends on 1) The optical arrangement of claim 1, wherein the optical element and the support element comprise a material with a coefficient of thermal expansion of less than 0.5 ppm/K. ### Claim 11 (depends on 1) The optical arrangement of claim 1, wherein the optical element is a mirror. ### Claim 12 (depends on 1) The optical arrangement of claim 1, wherein the support element and/or the optical element has at least one slot configured to cause at least partial decoupling in a radial direction. ### Claim 13 (depends on 1) The optical arrangement of claim 1, wherein the optical element has a central hole. ### Claim 14 (depends on 1) The optical arrangement of claim 1, wherein the optical element has a reinforced edge portion configured to stiffen the optical element. ### Claim 15 (depends on 1) An apparatus, comprising: an illumination system; and a projection objective, wherein the illumination system and/or the projection objective comprise an optical arrangement according to claim 1, and the apparatus is an EUV microlithographic projection exposure apparatus. ### Claim 16 (depends on 1) The arrangement of claim 1, wherein, in the radial direction, the at least three decoupling elements are between the support element and the outer circumference of the optical element. ### Claim 17 (depends on 1) The optical arrangement of claim 1, wherein the natural frequency of the optical arrangement is at least 300 Hz. ### Claim 18 (depends on 1) The optical arrangement of claim 1, wherein the natural frequency of the optical arrangement is at least 600 Hz. ### Claim 19 (depends on 1) The optical arrangement of claim 1, wherein the ratio of the maximum diameter of the optical element to the maximum thickness of the optical element is at least 15. ### Claim 20 (depends on 1) The optical arrangement of claim 1, wherein the ratio of the maximum diameter of the optical element to the maximum thickness of the optical element is at least 20. ### Claim 21 An apparatus, comprising: an illumination system; and a projection objective, wherein the illumination system and/or the projection objective comprises an optical arrangement, comprising: a mirror having outer circumference in a plane that extends in a radial direction of the mirror; a support element in the plane, the support element being outside of the outer circumference of the mirror in the plane; and at least three decoupling elements that connect the mirror and the support element, and wherein: the mirror, the support element and the decoupling elements are monolithic; the mirror has a ratio of a maximum diameter to a maximum thickness of at least 10; and the apparatus is an EUV microlithographic projection exposure apparatus. ### Claim 22 (depends on 21) The apparatus of claim 21, wherein the projection objective comprises the optical arrangement, and the mirror is a last mirror in an optical beam path of the projection objective. ### Claim 23 (depends on 21) The apparatus of claim 21, wherein, in the radial direction, the at least three decoupling elements are between the support element and the outer circumference of the mirror. ### Claim 24 (depends on 21) The apparatus of claim 21, wherein the natural frequency of the optical arrangement is at least 300 Hz. ### Claim 25 (depends on 21) The apparatus of claim 21, wherein the natural frequency of the optical arrangement is at least 600 Hz. ### Claim 26 (depends on 21) The apparatus of claim 21, wherein the ratio of the maximum diameter of the mirror to the maximum thickness of the mirror is at least 15. ### Claim 27 (depends on 21) The apparatus of claim 21, wherein the ratio of the maximum diameter of the mirror to the maximum thickness of the mirror is at least 20.