# US 9,436,098 B2 · Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,436,098 B2 - Document ID: US9436098B2 - Status: Granted - Kind: B2 - Application number: 14/635,339 - Filed: 2015-03-02 - Published: 2016-03-17 - Granted: 2016-09-06 - Earliest claimed: 2014-09-12 - Assignees: Samsung Display Co., Ltd. - Applicants: Samsung Display Co., Ltd. - Inventors: Jung-Chul Heo; Hi-Kuk Lee; Jae-Hyuk Chang; Sang-Hyun Lee; Jung-In Park; Sang-Hyun Yun; Ki-Beom Lee; Hyun-Seok Kim; Kab-Jong Seo; Jun-Ho Sim; Byoung-Min Yun; Sang-Don Jang; Jae-Young Jang; Chang-Hoon Kim - Web page: https://patentgrep.com/patent/US9436098B2 ## CPC - G03F 7/70508: {Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus} - G03F 7/2022: {Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure} - G03F 7/2051: {Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source (G03F7/70 takes precedence)} - G03F 7/702: {Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems} - G03F 7/70291: {Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices} - G03F 7/70391: {Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays} - H10D 30/6729: {characterised by the electrodes} - H10D 30/6732: {Bottom-gate only TFTs} - H10D 30/6746: {Amorphous silicon} - H10D 30/6756: {Amorphous oxide semiconductors} - H10D 30/6757: {characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile (TFTs having channel structures for preventing kink or snapback effects H10D30/6708; TFTs having lightly-doped source or drain extensions H10D30/6715)} - H10D 86/021: {of multiple TFTs} - H10D 86/421: {having a particular composition, shape or crystalline structure of the active layer} - H10D 86/441: {Interconnections, e.g. scanning lines} - H10D 86/60: wherein the TFTs are in active matrices - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES ## Abstract A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head. ## Claims ### Claim 1 A maskless exposure device comprising: an exposure head comprising a digital micro-mirror device, wherein the digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate; and a system control part configured to control the digital micro-mirror device by using a graphic data system file, wherein the graphic data system file comprises data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode, and wherein the graphic data system file comprises data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head. ### Claim 2 (depends on 1) The maskless exposure device of claim 1, wherein the channel portion has a “U” shape in a plan view. ### Claim 3 (depends on 2) The maskless exposure device of claim 2, wherein the channel portion further comprises: a first extension portion extending in the diagonal direction with respect to the scan direction of the exposure head; a second extension portion bent from the first extension portion and extending in the diagonal direction with respect to the scan direction of the exposure head; and a connecting portion connecting the first extension portion and the second extension portion. ### Claim 4 (depends on 3) The maskless exposure device of claim 3, wherein the first extension portion is parallel with the second extension portion. ### Claim 5 (depends on 3) The maskless exposure device of claim 3, wherein the first extension portion is inclined at a first angle with respect to the scan direction of the exposure head, wherein the second extension portion is inclined at a second angle with respect to the scan direction of the exposure head, and wherein the second angle is different from the first angle. ### Claim 6 (depends on 1) The maskless exposure device of claim 1, wherein the channel portion has a “V” shape in a plan view. ### Claim 7 (depends on 1) The maskless exposure device of claim 1, wherein the system control part further comprises: a file producing part configured to produce the graphic data system file corresponding to a pattern to be formed on the substrate; a data outputting part configured to generate digital micro-mirror device on/off data from the graphic data system file to control on/off timing of the digital micro-mirror device; and a transfer control part configured to output a transfer signal, wherein the transfer signal transfers a stage configured to fix the substrate thereto. ### Claim 8 (depends on 7) The maskless exposure device of claim 7, wherein the transfer control part controls on/off timing of the exposure beam in response to the digital micro-mirror device on/off data supplied from the data outputting part, and transfers the stage. ### Claim 9 A method of maskless exposure, the method comprising: producing a graphic data system file for forming a pattern on a substrate; generating digital micro-mirror device on/off data from the graphic data system file; and exposing the substrate in response to the digital micro-mirror device on/off data, wherein the graphic data system file comprises data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode in a plan view, and wherein the graphic data system file comprises data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head. ### Claim 10 (depends on 9) The method of claim 9, wherein the channel portion has a “U” shape in a plan view. ### Claim 11 (depends on 10) The method of claim 10, wherein the channel portion further comprises: a first extension portion extending in the diagonal direction with respect to the scan direction of the exposure head; a second extension portion bent from the first extension portion and extending in the diagonal direction with respect to the scan direction of the exposure head; and a connecting portion connecting the first extension portion and the second extension portion. ### Claim 12 (depends on 11) The method of claim 11, wherein the first extension portion is parallel with the second extension portion. ### Claim 13 (depends on 11) The method of claim 11, wherein the first extension portion is inclined at a first angle with respect to the scan direction of the exposure head, wherein the second extension portion is inclined at a second angle with respect to the scan direction of the exposure head, and wherein the second angle is different from the first angle. ### Claim 14 (depends on 9) The method of claim 9, wherein the channel portion has a “V” shape in a plan view.