# US 9,436,097 B2 · Lithographic apparatus and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,436,097 B2 - Document ID: US9436097B2 - Status: Granted - Kind: B2 - Application number: 14/586,518 - Filed: 2014-12-30 - Published: 2015-04-23 - Granted: 2016-09-06 - Earliest claimed: 2004-10-18 - Assignees: ASML Netherlands B.V. - Applicants: Asml Netherlands B.V. - Inventors: Jeroen Johannes Sophia Maria Mertens; Sjoerd Nicolaas Lambertus Donders; Roelof Frederik De Graaf; Christiaan Alexander Hoogendam; Antonius Johannus Van Der Net; Franciscus Johannes Herman Maria Teunissen; Patricius Aloysius Jacobus Tinnemans; Martinus Cornelis Maria Verhagen; Jacobus Johannus Leonardus Hendricus Verspay; Edwin Augustinus Matheus Van Gompel - Web page: https://patentgrep.com/patent/US9436097B2 ## CPC - G03F 7/70716: {Stages} - G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region. ## Claims ### Claim 1 A lithographic apparatus comprising: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and an evacuation system comprising a chamber arranged to allow liquid to be separated from gas in a mixture of gas and liquid from the space and the chamber having an inlet into the chamber in a bottom surface of the chamber, the evacuation system configured to draw the mixture of gas and liquid from the space through the inlet into the chamber. ### Claim 2 (depends on 1) The lithographic apparatus according to claim 1, wherein the evacuation system further comprises a pump configured to pump liquid from the chamber. ### Claim 3 (depends on 1) The lithographic apparatus according to claim 1, wherein the chamber comprises a porous element through which liquid can pass. ### Claim 4 (depends on 3) The lithographic apparatus according to claim 3, further comprising an exhaust line from the chamber, the exhaust line configured to exhaust gas from the mixture, wherein an opening of the exhaust line is arranged in or on the chamber above at least part of the porous element. ### Claim 5 (depends on 1) The lithographic apparatus according to claim 1, further comprising at least two lines to remove fluid from the chamber. ### Claim 6 (depends on 5) The lithographic apparatus according to claim 5, wherein a first line of the at least two lines has an opening located at a predominantly liquid filled portion of the chamber, and a second line of the at least two lines has an opening located at a predominantly gas filled portion of the chamber. ### Claim 7 (depends on 5) The lithographic apparatus according to claim 5, wherein at least one of the lines is connected to a pump. ### Claim 8 (depends on 5) The lithographic apparatus according to claim 5, wherein the evacuation system comprises a hydrophobic surface to block liquid from passing through a line of the at least two lines. ### Claim 9 (depends on 5) The lithographic apparatus according to claim 5, wherein a line of the at least two lines comprises a filter to block liquid. ### Claim 10 A lithographic apparatus comprising: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and an evacuation system comprising a chamber arranged to allow liquid to be separated from gas in a mixture of gas and liquid from the space, the chamber having an exhaust line from the chamber, wherein the evacuation system is configured to draw the mixture of gas and liquid from the space into the chamber and having a structure, at the exhaust line, configured to block liquid from passing through at least part of the exhaust line. ### Claim 11 (depends on 10) The lithographic apparatus according to claim 10, wherein the structure comprises a hydrophobic surface to block liquid from passing through at least part of the exhaust line. ### Claim 12 (depends on 10) The lithographic apparatus according to claim 10, wherein the structure comprises a filter in the exhaust line to block liquid from passing through at least part of the exhaust line. ### Claim 13 (depends on 10) The lithographic apparatus according to claim 10, wherein the chamber comprises a porous element through which liquid can pass. ### Claim 14 (depends on 13) The lithographic apparatus according to claim 13, wherein the exhaust line is configured to exhaust gas from the mixture, wherein an opening of the exhaust line is arranged in or on the chamber above at least part of the porous element. ### Claim 15 (depends on 10) The lithographic apparatus according to claim 10, further comprising a removal line having an opening located at a predominantly liquid filled portion of the chamber, and the exhaust line has an opening located at a predominantly gas filled portion of the chamber. ### Claim 16 A lithographic apparatus comprising: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; an evacuation system comprising a first chamber comprising a fluid removal line, wherein the fluid removal line is configured to draw a mixture of gas and liquid from the space into the first chamber and to remove fluid from the first chamber and the first chamber is configured to separate gas from liquid in the mixture drawn into the first chamber from the space; and a second chamber configured to separate gas from liquid. ### Claim 17 (depends on 16) The lithographic apparatus according to claim 16, wherein the first chamber comprises a porous element through which the mixture is drawn into the first chamber. ### Claim 18 (depends on 17) The lithographic apparatus according to claim 17, further comprising an exhaust line to remove fluid from the first chamber, wherein an opening of the exhaust line is located above an opening of the fluid removal line. ### Claim 19 (depends on 18) The lithographic apparatus according to claim 18, wherein the evacuation system has a structure, at the exhaust line, configured to block liquid from passing through at least part of the exhaust line. ### Claim 20 (depends on 16) The lithographic apparatus according to claim 16, further comprising an exhaust line having an opening located at a predominantly gas filled portion of the first chamber, and the fluid removal line has an opening located at a predominantly liquid filled portion of the first chamber.