# US 9,436,096 B2 · Lithographic apparatus and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,436,096 B2 - Document ID: US9436096B2 - Status: Granted - Kind: B2 - Application number: 14/586,333 - Filed: 2014-12-30 - Published: 2015-04-30 - Granted: 2016-09-06 - Earliest claimed: 2005-12-30 - Assignees: ASML Netherlands B.V. - Applicants: Asml Netherlands B.V. - Inventors: Koen Jacobus Johannes Maria Zaal; Joost Jeroen Ottens - Web page: https://patentgrep.com/patent/US9436096B2 ## CPC - G03F 7/70716: {Stages} - G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)} - G03F 7/70725: {control} - G03F 7/70775: {Position control, e.g. interferometers or encoders for determining the stage position} - G03F 7/70783: {Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight} - G03F 7/7085: {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load} - G03F 7/70858: {Environment aspects, e.g. pressure of beam-path gas, temperature (pollution aspects G03F7/70916)} - G03F 7/70875: {Temperature, e.g. temperature control of masks or workpieces via control of stage temperature} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed. ## Claims ### Claim 1 A lithographic apparatus, comprising: a substrate table arranged to support a substrate, the substrate table comprising a two-dimensional array of protrusions; a projection system configured to project a modulated radiation beam onto a substrate; a liquid supply system configured to provide a liquid in a region between the projection system and the substrate during exposure; a single cover plate having an opening wider than the substrate, the cover plate removably supported on the array of protrusions during exposure, and configured to provide a surface facing the projection system that is substantially adjacent to the substrate. ### Claim 2 (depends on 1) The apparatus according to claim 1, wherein the array of protrusions comprises low thermal conductance burls on which the cover plate is mounted. ### Claim 3 (depends on 2) The apparatus according to claim 2, wherein the low conductance burls are arranged to have low thermal conductivity, minimal contact area with the cover plate, minimal contact area with the substrate table, or any combination of the foregoing. ### Claim 4 (depends on 1) The apparatus according to claim 1, further comprising a reflective surface of the substrate table, the cover plate, or both. ### Claim 5 (depends on 1) The apparatus according to claim 1, wherein the array of protrusions extend under the cover plate and under the substrate when supported by the substrate table. ### Claim 6 (depends on 5) The apparatus according to claim 5, wherein the tops of the plurality of protrusions under the cover plate and the substrate arranged in a substantially flat plane. ### Claim 7 (depends on 1) The apparatus according to claim 1, further comprising a plurality of electric heaters configured to heat at least part of the cover plate, the substrate table, or both. ### Claim 8 A lithographic apparatus, comprising: a substrate table arranged to support a substrate; a projection system configured to project a modulated radiation beam onto a substrate; a liquid supply system configured to provide a liquid in a region between the projection system and the substrate during exposure; a plurality of cover plates; a two-dimensional array of protrusions between the cover plates and the substrate table, wherein the cover plates are removably supported on the array of protrusions around the substrate during exposure to provide a surface facing the projection system. ### Claim 9 (depends on 8) The apparatus according to claim 8, wherein the array of protrusions is provided on the substrate table to support the cover plate. ### Claim 10 (depends on 9) The apparatus according to claim 9, wherein the array of protrusions extend under the cover plates and under the substrate when supported by the substrate table. ### Claim 11 (depends on 10) The apparatus according to claim 10, wherein the tops of the plurality of protrusions under the cover plates and the substrate arranged in a substantially flat plane. ### Claim 12 (depends on 8) The apparatus according to claim 8, wherein the array of protrusions is provided on the cover plates. ### Claim 13 (depends on 8) The apparatus according to claim 8, further comprising a reflective surface of the substrate table, the cover plates, or both. ### Claim 14 (depends on 8) The apparatus according to claim 8, further comprising a plurality of electric heaters configured to heat at least part of the cover plate, the substrate table, or both. ### Claim 15 A lithographic apparatus, comprising: a substrate table arranged to support a substrate; a projection system configured to project a modulated radiation beam onto a substrate; a liquid supply system configured to provide a liquid in a region between the projection system and the substrate during exposure; a cover plate configured to be to the side of the substrate during exposure; and a two-dimensional array of protrusions, the array of protrusions arranged to extend under the cover plate and under the substrate when supported by the substrate table and the tops of the plurality of protrusions under the cover plate and the substrate are arranged in a substantially flat plane. ### Claim 16 (depends on 15) The apparatus according to claim 15, wherein the cover plate has an aperture wider than the substrate. ### Claim 17 (depends on 15) The apparatus according to claim 15, wherein the array of protrusions comprises low thermal conductance burls on which the cover plate is mounted. ### Claim 18 (depends on 15) The apparatus according to claim 15, further comprising a reflective surface of the substrate table, the cover plate, or both. ### Claim 19 (depends on 15) The apparatus according to claim 15, wherein the cover plate is detachably mounted on the plurality of protrusions. ### Claim 20 (depends on 15) The apparatus according to claim 15, comprising a plurality of cover plates configured to be to the side of the substrate during exposure.