# US 9,436,077 B2 · Method of fabricating a pellicle frame

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- Number: US 9,436,077 B2
- Document ID: US9436077B2
- Status: Granted
- Kind: B2
- Application number: 13/827,542
- Filed: 2013-03-14
- Published: 2013-08-08
- Granted: 2016-09-06
- Earliest claimed: 2009-09-14
- Assignees: Samsung Electronics Co., Ltd.; Fine Semitech Corp.
- Applicants: Samsung Electronics Co., Ltd.; Fine Semitech Corp.
- Inventors: Jeong jin Kim; Bum hyun An; Chan uk Jeon; Han shin Lee; Jae hyuck Choi; Seung wan Kim; Ik jun Kim; Jang dong You
- Web page: https://patentgrep.com/patent/US9436077B2

## CPC

- G03F 1/62: Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- C25D 11/024: {Anodisation under pulsed or modulated current or potential}
- C25D 11/026: {Anodisation with spark discharge}
- C25D 11/04: of aluminium or alloys based thereon
- C25D 11/06: characterised by the electrolytes used
- C25D 11/18: After-treatment, e.g. pore-sealing
- G03F 1/64: characterised by the frames, e.g. structure or material, including bonding means therefor
- Y10T 428/13: Hollow or container type article [e.g., tube, vase, etc.]
- Y10T 428/1317: Multilayer [continuous layer]
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C25D: PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

A pellicle frame, including aluminum, aluminum oxide, and a transition metal.

## Claims

### Claim 1

A method of fabricating a lithography apparatus, the method comprising:
preparing a main body of a pellicle frame that includes a first material layer including aluminum, the first material layer having a vent hole;
forming a second material layer on a surface of the first material layer of the pellicle frame using a wet process using wet oxidation plasma, the second material layer including aluminum oxide and a transition metal, the second material layer being formed on the first material layer such that the first material layer is completely enclosed by the second material layer excepting a sidewall of the vent hole; and
attaching a pellicle membrane to the pellicle frame having the second material layer with an adhesive layer interposed between the second material layer and the pellicle membrane.

### Claim 2 (depends on 1)

The method as claimed in claim 1, wherein forming the second material layer includes:
dipping the main body in an alkali electrolytic solution containing ions of the transition metal; and
generating the wet oxidation plasma in a periphery of the main body to form the second material layer including the aluminum oxide and the transition metal on the surface of the first material layer.

### Claim 3 (depends on 2)

The method as claimed in claim 2, wherein generating the wet oxidation plasma includes:
applying a positive current pulse to the main body; and
applying a negative current pulse to the alkali electrolytic solution.

### Claim 4 (depends on 1)

The method as claimed in claim 1, further comprising, after forming the second material layer, dipping the main body in deionized water.

### Claim 5 (depends on 4)

The method as claimed in claim 4, wherein the deionized water is maintained at a temperature of about 70° C. or higher.

### Claim 6 (depends on 1)

The method as claimed in claim 1, wherein the second material layer is formed to a thickness of about 5 to about 30 μm.