# US 9,435,642 B2 · Position measuring apparatus, pattern transfer apparatus, and method for manufacturing a device

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- Number: US 9,435,642 B2
- Document ID: US9435642B2
- Status: Granted
- Kind: B2
- Application number: 13/863,735
- Filed: 2013-04-16
- Published: 2013-11-07
- Granted: 2016-09-06
- Earliest claimed: 2012-04-20
- Assignees: Canon Kabushiki Kaisha
- Applicants: Canon Kabushiki Kaisha
- Inventors: Keiji Emoto; Naoki Maruyama
- Web page: https://patentgrep.com/patent/US9435642B2

## CPC

- G01B 11/27: for testing the alignment of axes {(means for centering or aligning a light guide within a ferrule G02B6/3834)}
- G01B 7/00: Measuring arrangements characterised by the use of electric or magnetic techniques
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- H05K 3/0008: {for aligning or positioning of tools relative to the circuit board (H05K3/4638, H05K3/4679 take precedence; for manufacturing assemblages of components H05K13/0015)}
- H05K 2203/166: Alignment or registration; Control of registration
- H10P 72/0606: {Position monitoring, e.g. misposition detection or presence detection}
- G01B: MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- H05K: PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A position measuring apparatus configured to measure a position of an measured object using a plate-like scale including a grating pattern, includes a supporting unit configured to be arranged between a structure and the scale and to support the scale, in which the supporting unit includes a spring element that reduces vibration transferred from the structure to the scale in a plate thickness direction.

## Claims

### Claim 1

A position measuring apparatus for measuring a position of a measured object, the position measuring apparatus comprising:
a sensor head provided on the measured object;
a scale irradiated with light from the sensor head and having a thickness in a direction of gravitational force;
a structure supported by a floor via a vibration isolation apparatus that reduces vibration transferred from the floor to the structure; and
a supporting unit disposed between the structure and the scale, and configured to support the scale in the direction,
wherein the supporting unit includes a spring element having a spring constant that reduces vibration, transferred from the floor to the scale through the vibration isolation apparatus and the structure, in the direction,
wherein, in a case where a mass of an object including the scale and supported by the supporting unit is set to m and the spring constant of the supporting unit is set to k, a frequency fc in the direction represented by the following Equation is set to a value equal to or less than 10 Hz,
fc
=
1
2
⁢
π
·
|
k
|
m
wherein the position measuring apparatus comprises a position sensor configured to measure a relative position in the direction between the structure or a reference object mounted on the structure and the scale,
wherein the position measuring apparatus further comprises a driving unit configured to drive the object including the scale in the direction based on an output from the position sensor,
wherein the supporting unit has a negative spring constant, and
wherein a servo control frequency for positioning the object including the scale in the direction by the driving unit and the position sensor is set to a value, not less than 1 and not greater than 10, times the fc.

### Claim 2

A position measuring apparatus for measuring a position of a measured object, the position measuring apparatus comprising:
a sensor head provided on the measured object;
a scale irradiated with light from the sensor head and having a thickness in a direction of gravitational force;
a structure supported by a floor via a vibration isolation apparatus that reduces vibration transferred from the floor to the structure; and
a supporting unit disposed between the structure and the scale, and configured to support the scale in the direction,
wherein the supporting unit includes a spring element having a spring constant that reduces vibration, transferred from the floor to the scale through the vibration isolation apparatus and the structure, in the direction,
wherein, in a case where a mass of an object including the scale and supported by the supporting unit is set to m and the spring constant of the supporting unit is set to k, a frequency fc in the direction represented by the following Equation is set to a value equal to or less than 10 Hz,
fc
=
1
2
⁢
π
·
|
k
|
m
wherein the position measuring apparatus comprises a position sensor configured to measure a relative position in the direction between the structure or a reference object mounted on the structure and the scale,
wherein the position measuring apparatus further comprises a driving unit configured to drive the object including the scale in the direction based on an output from the position sensor,
wherein the supporting unit has a positive spring constant, and
wherein a servo control frequency for positioning the object including the scale in the direction by the driving unit and the position sensor is set to a value, not greater than ½ or not less than √2 and not greater than 10, times the fc.

### Claim 3

An apparatus for forming a pattern on a substrate, the apparatus comprising:
a stage configured to be movable and hold the substrate; and
a position measuring apparatus configured to measure a position of the stage,
wherein the position measuring apparatus comprises:
a sensor head provided on a measured object,
a scale irradiated with light from the sensor head and having a thickness in a direction of gravitational force,
a structure supported by a floor via a vibration isolation apparatus that reduces vibration transferred from the floor to the structure, and
a supporting unit disposed between the structure and the scale, and configured to support the scale in the direction,
wherein the supporting unit includes a spring element having a spring constant that reduces vibration, transferred from the floor to the scale through the vibration isolation apparatus and the structure, in the direction,
wherein, in a case where a mass of an object including the scale and supported by the supporting unit is set to m and the spring constant of the supporting unit is set to k, a frequency fc in the direction represented by the following Equation is set to a value equal to or less than 10 Hz,
fc
=
1
2
⁢
π
·
|
k
|
m
wherein the position measuring apparatus comprises a position sensor configured to measure a relative position in the direction between the structure or a reference object mounted on the structure and the scale,
wherein the position measuring apparatus further comprises a driving unit configured to drive the object including the scale in the direction based on an output from the position sensor,
wherein the supporting unit has a negative spring constant, and
wherein a servo control frequency for positioning the object including the scale in the direction by the driving unit and the position sensor is set to a value, not less than 1 and not greater than 10, times the fc.

### Claim 4

An apparatus for forming a pattern on a substrate, the apparatus comprising:
a stage configured to be movable and hold the substrate; and
a position measuring apparatus configured to measure a position of the stage,
wherein the position measuring apparatus comprises:
a sensor head provided on a measured object,
a scale irradiated with light from the sensor head and having a thickness in a direction of gravitational force,
a structure supported by a floor via a vibration isolation apparatus that reduces vibration transferred from the floor to the structure, and
a supporting unit disposed between the structure and the scale, and configured to support the scale in the direction,
wherein the supporting unit includes a spring element having a spring constant that reduces vibration, transferred from the floor to the scale through the vibration isolation apparatus and the structure, in the direction,
wherein, in a case where a mass of an object including the scale and supported by the supporting unit is set to m and the spring constant of the supporting unit is set to k, a frequency fc in the direction represented by the following Equation is set to a value equal to or less than 10 Hz,
fc
=
1
2
⁢
π
·
|
k
|
m
wherein the position measuring apparatus comprises a position sensor configured to measure a relative position in the direction between the structure or a reference object mounted on the structure and the scale,
wherein the position measuring apparatus further comprises a driving unit configured to drive the object including the scale in the direction based on an output from the position sensor,
wherein the supporting unit has a positive spring constant, and
wherein a servo control frequency for positioning the object including the scale in the direction by the driving unit and the position sensor is set to a value, not greater than ½ or not less than √2 and not greater than 10, times the fc.

### Claim 5

A method of manufacturing a device, the method comprising:
forming a pattern on a substrate using an apparatus; and
developing the substrate, on which the pattern has been formed, to manufacture the device,
wherein the apparatus comprises:
a stage configured to be movable and hold the substrate, and
a position measuring apparatus configured to measure a position of the stage,
wherein the position measuring apparatus comprises:
a sensor head provided on a measured object,
a scale irradiated with light from the sensor head and having a thickness in a direction of gravitational force,
a structure supported by a floor via a vibration isolation apparatus that reduces vibration transferred from the floor to the structure, and
a supporting unit disposed between the structure and the scale, and configured to support the scale in the direction,
wherein the supporting unit includes a spring element having a spring constant that reduces vibration, transferred from the floor to the scale through the vibration isolation apparatus and the structure, in the direction,
wherein, in a case where a mass of an object including the scale and supported by the supporting unit is set to m and the spring constant of the supporting unit is set to k, a frequency fc in the direction represented by the following Equation is set to a value equal to or less than 10 Hz,
fc
=
1
2
⁢
π
·
|
k
|
m
wherein the position measuring apparatus comprises a position sensor configured to measure a relative position in the direction between the structure or a reference object mounted on the structure and the scale,
wherein the position measuring apparatus further comprises a driving unit configured to drive the object including the scale in the direction based on an output from the position sensor,
wherein the supporting unit has a negative spring constant, and
wherein a servo control frequency for positioning the object including the scale in the direction by the driving unit and the position sensor is set to a value, not less than 1 and not greater than 10, times the fc.

### Claim 6

A method of manufacturing a device, the method comprising:
forming a pattern on a substrate using an apparatus; and
developing the substrate, on which the pattern has been formed, to manufacture the device,
wherein the apparatus comprises:
a stage configured to be movable and hold the substrate, and
a position measuring apparatus configured to measure a position of the stage,
wherein the position measuring apparatus comprises:
a sensor head provided on a measured object,
a scale irradiated with light from the sensor head and having a thickness in a direction of gravitational force,
a structure supported by a floor via a vibration isolation apparatus that reduces vibration transferred from the floor to the structure, and
a supporting unit disposed between the structure and the scale, and configured to support the scale in the direction,
wherein the supporting unit includes a spring element having a spring constant that reduces vibration, transferred from the floor to the scale through the vibration isolation apparatus and the structure, in the direction,
wherein, in a case where a mass of an object including the scale and supported by the supporting unit is set to m and the spring constant of the supporting unit is set to k, a frequency fc in the direction represented by the following Equation is set to a value equal to or less than 10 Hz,
fc
=
1
2
⁢
π
·
|
k
|
m
wherein the position measuring apparatus comprises a position sensor configured to measure a relative position in the direction between the structure or a reference object mounted on the structure and the scale,
wherein the position measuring apparatus further comprises a driving unit configured to drive the object including the scale in the direction based on an output from the position sensor,
wherein the supporting unit has a positive spring constant, and
wherein a servo control frequency for positioning the object including the scale in the direction by the driving unit and the position sensor is set to a value, not greater than ½ or not less than √2 and not greater than 10, times the fc.

### Claim 7

A positioning measuring apparatus for measuring a position of a measured object, the positioning measuring apparatus comprising:
a sensor head provided to the measured object;
a scale irradiated with light from the sensor head and having a thickness in a direction of gravitational force;
a structure supported by a floor via a vibration isolation apparatus that reduces vibration transferred from the floor to the structure; and
supporting means having a spring constant to support the scale in the direction so that vibration, transferred from the floor to the scale through the vibration isolation apparatus and the structure, in the direction is reduced via the supporting means,
wherein, in a case where a mass of an object including the scale and supported by the supporting means is set to m and the spring constant of the supporting means is set to k, a frequency fc in the direction represented by the following Equation is set to a value equal to or less than 10 Hz,
fc
=
1
2
⁢
π
·
|
k
|
m
wherein the position measuring apparatus comprises a position sensor configured to measure a relative position in the direction between the structure or a reference object mounted on the structure and the scale,
wherein the position measuring apparatus further comprises a driving unit configured to drive the object including the scale in the direction based on an output from the position sensor,
wherein the supporting means has a negative spring constant, and
wherein a servo control frequency for positioning the object including the scale in the direction by the driving unit and the position sensor is set to a value, not less than 1 and not greater than 10, times the fc.

### Claim 8

A positioning measuring apparatus for measuring a position of a measured object, the positioning measuring apparatus comprising:
a sensor head provided to the measured object;
a scale irradiated with light from the sensor head and having a thickness in a direction of gravitational force;
a structure supported by a floor via a vibration isolation apparatus that reduces vibration transferred from the floor to the structure; and
supporting means having a spring constant to support the scale in the direction so that vibration, transferred from the floor to the scale through the vibration isolation apparatus and the structure, in the direction is reduced via the supporting means,
wherein, in a case where a mass of an object including the scale and supported by the supporting means is set to m and the spring constant of the supporting means is set to k, a frequency fc in the direction represented by the following Equation is set to a value equal to or less than 10 Hz,
fc
=
1
2
⁢
π
·
|
k
|
m
wherein the position measuring apparatus comprises a position sensor configured to measure a relative position in the direction between the structure or a reference object mounted on the structure and the scale,
wherein the position measuring apparatus further comprises a driving unit configured to drive the object including the scale in the direction based on an output from the position sensor,
wherein the supporting means has a positive spring constant, and
wherein a servo control frequency for positioning the object including the scale in the direction by the driving unit and the position sensor is set to a value, not greater than ½ or not less than √2 and not greater than 10, times the fc.