# US 9,435,041 B2 · Method and regeneration apparatus for regenerating a plating composition

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- Number: US 9,435,041 B2
- Document ID: US9435041B2
- Status: Granted
- Kind: B2
- Application number: 14/985,761
- Filed: 2015-12-31
- Published: 2016-06-02
- Granted: 2016-09-06
- Earliest claimed: 2012-06-05
- Assignees: Atotech Deutschland GmbH
- Applicants: Atotech Deutschland GmbH
- Inventors: Arnd Kilian; Christian Nöthlich; Dieter Metzger; Sebastian Kühne
- Web page: https://patentgrep.com/patent/US9435041B2

## CPC

- C25B 9/19: with diaphragms
- C23C 18/1617: {Purification and regeneration of coating baths}
- C23C 18/52: using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50
- C23C 18/54: Contact plating, i.e. electroless electrochemical plating
- C25B: ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR (anodic or cathodic protection C23F13/00; single-crystal growth C30B)
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

A method and apparatus for regenerating a plating composition which is suitable for depositing at least one first metal on a substrate where the plating rate in the plating composition is very low, where the concentration of the at least one first metal in the plating composition cannot be easily set at a constant level, and where plating-out of the at least one first metal from the plating composition takes place. The method and apparatus for regenerating a plating composition is suitable for depositing at least one first metal on a substrate at a sufficiently high plating rate, while offering the opportunity to easily adjust the concentration of the at least one first metal in the plating composition at a constant level and to provide the plating composition with sufficient stability against decomposition thereof in order to safeguard the regeneration cell from plated-out first metal.

## Claims

### Claim 1

Regeneration apparatus (300) for regenerating a plating composition which is suitable for depositing at least one first metal on a substrate (10), said regeneration apparatus (300) being especially adapted to perform a method of regenerating a plating composition which is suitable for depositing at least one first metal on a substrate (10) and which is accommodated by at least one plating device (100), said plating composition containing said at least one first metal in an ionic form and at least one second metal in an ionic form, wherein said at least one second metal may be provided in a higher and in a lower oxidation state and, when it is provided in a lower oxidation state, is capable of reducing said at least one first metal being in the ionic form to a metallic state, wherein said plating composition is accommodated by at least one plating device (100) and contains at least one first metal in an ionic form and at least one second metal in an ionic form, wherein said at least one second metal may be provided in a higher and in a lower oxidation state and, when it is provided in a lower oxidation state, is capable of reducing said at least one first metal being in the ionic form to a metallic state, said regeneration apparatus (300) comprising:
(a) at least one regeneration device (200) comprising:
i. a working electrode compartment (202) and a counter electrode compartment (203);
ii. a working electrode (205) being disposed in said working electrode compartment (202) and a counter electrode (206) being disposed in said counter electrode compartment (203);
iii. an ion selective membrane (204) separating said working electrode compartment (202) and said counter electrode compartment (203) from each other;
iv. an electric current supply for energizing said working electrode (205) and said counter electrode (206);
(b) means (250, 260, 257, 267) for removing at least part of said plating composition from said at least one plating device (100) and means (280, 285, 286) for contacting said removed plating composition with said working electrode (205);
(c) at least one first holding tank (230) being adapted for accommodating a first portion of said removed composition after said first portion of said removed composition has been cathodically treated in said regeneration device (200);
(d) at least one second holding tank (240) being adapted for accommodating a second portion of said removed composition after said second portion of said removed composition has been anodically treated in said regeneration device (200); and
(e) means (250, 260, 235, 245) for returning said first and second portions to said at least one plating device (100),
wherein said at least one first holding tank (230) and said at least one second holding tank (240) are in fluid connection with said at least one regeneration device (200).

### Claim 2 (depends on 1)

The apparatus (300) according to claim 1, wherein said at least one working electrode (205) is made from said at least one first metal in the metallic state.

### Claim 3 (depends on 2)

The apparatus (300) according to claim 2, wherein said at least one working electrode (205) is made of pieces of said at least one first metal in the metallic state and wherein said pieces of said at least one first metal in the metallic state are contained in a container (207) which is made from an inert material.

### Claim 4 (depends on 2)

The apparatus according to claim 2, wherein said ion selective membrane (204) is a cation selective membrane.

### Claim 5 (depends on 1)

The apparatus (300) according to claim 1, wherein said at least one working electrode (205) is made of pieces of said at least one first metal in the metallic state and wherein said pieces of said at least one first metal in the metallic state are contained in a container (207) which is made from an inert material.

### Claim 6 (depends on 5)

The apparatus according to claim 5, wherein said at least one first metal is tin.

### Claim 7 (depends on 6)

The apparatus according to claim 6, wherein said ion selective membrane (204) is a cation selective membrane.

### Claim 8 (depends on 5)

The apparatus according to claim 5, wherein said ion selective membrane (204) is a cation selective membrane.

### Claim 9 (depends on 3)

The apparatus according to claim 3, wherein said at least one first metal is tin.

### Claim 10 (depends on 3)

The apparatus according to claim 3, wherein said ion selective membrane (204) is a cation selective membrane.

### Claim 11 (depends on 1)

The apparatus according to claim 1, wherein said ion selective membrane (204) is a cation selective membrane.

### Claim 12

A Regeneration apparatus (300) for regenerating a plating composition which is suitable for depositing at least one first metal on a substrate (10), said regeneration apparatus (300) being especially adapted for regenerating a plating composition which is suitable for depositing at least one first metal on a substrate (10) and which is accommodated by at least one plating device (100), said plating composition containing said at least one first metal in an ionic form and at least one second metal in an ionic form, wherein said at least one second metal may be provided in a higher and in a lower oxidation state and, when it is provided in a lower oxidation state, is capable of reducing said at least one first metal being in the ionic form to a metallic state, wherein said plating composition is accommodated by at least one plating device (100) and contains at least one first metal in an ionic form and at least one second metal in an ionic form, wherein said at least one second metal may be provided in a higher and in a lower oxidation state and, when it is provided in a lower oxidation state, is capable of reducing said at least one first metal being in the ionic form to a metallic state, said regeneration apparatus (300) comprising:
(a) at least one regeneration device (200) comprising:
i. a working electrode compartment (202) and a counter electrode compartment (203);
ii. a working electrode (205) being disposed in said working electrode compartment (202) and a counter electrode (206) being disposed in said counter electrode compartment (203);
iii. an ion selective membrane (204) separating said working electrode compartment (202) and said counter electrode compartment (203) from each other;
iv. an electric current supply for energizing said working electrode (205) and said counter electrode (206);
(b) means (250, 260, 257, 267) for removing at least part of said plating composition from said at least one plating device (100) and means (280, 285, 286) for contacting said removed plating composition with said working electrode (205);
(c) at least one first holding tank (230) being adapted for accommodating a first portion of said removed composition after said first portion of said removed composition has been cathodically treated in said regeneration device (200);
(d) at least one second holding tank (240) being adapted for accommodating a second portion of said removed composition after said second portion of said removed composition has been anodically treated in said regeneration device (200); and
(e) means (250, 260, 235, 245) for returning said first and second portions to said at least one plating device (100),
wherein said at least one first holding tank (230) and said at least one second holding tank (240) are in fluid connection with said at least one regeneration device (200);
(f) wherein said at least one working electrode (205) is made from said at least one first metal in the metallic state;
(g) wherein said at least one working electrode (205) is made of pieces of said at least one first metal in the metallic state and wherein said pieces of said at least one first metal in the metallic state are contained in a container (207) which is made from an inert material;
(h) wherein said at least one first metal is tin; and
(i) wherein said ion selective membrane (204) is a cation selective membrane.