Array substrate, method for manufacturing the same, display device

A method for manufacturing an array substrate, comprising steps of:

• S1:
• manufacturing a gate metal layer, comprising forming a gate electrode, a gate line and a common electrode line, the formed gate line comprising a plurality of separate segments which are arranged to be spaced apart from each other, the formed common electrode line having a connection segment extending through a gap between the separate segments to a predetermined position;
• S2:
• manufacturing a thin film transistor, comprising forming a gate insulation layer, a semi-conductive layer, source and drain electrodes, and a data line;
• S3:
• forming a common electrode which is electrically connected with the common electrode line via the connection segment extending through the gap;
• S4:
• forming a passivation protection layer;
• S5:
• forming pixel electrodes,
• wherein the method further comprises forming a bridge, and two ends of the bridge are electrically connected with two adjacent separate segments respectively.

A method for manufacturing an array substrate, comprising steps of:

• forming a plurality of separate segments which are components of a gate line, the plurality of separate segments are spaced apart from each other;
• forming a common electrode line having a connection segment extending through a gap between the separate segments to a predetermined position;
• forming a bridge, two ends of the bridge are electrically connected with two adjacent separate segments respectively;
• and
• forming a common electrode electrically connected with the common electrode line by the connection segment extending through the gap.