US 9,431,300 B1 · MOL architecture enabling ultra-regular cross couple

Abstract

A method of forming an ultra-regular layout with unidirectional M1 metal line and the resulting device are disclosed. Embodiments include forming first and second vertical gate lines, spaced from and parallel to each other; forming a M1 metal line parallel to and between the first and second gate lines; forming first, second, and third M0 metal segments perpendicular to the M1 metal line; connecting the first M0 metal segment to the M1 metal line and the second gate line; connecting the second M0 metal segment to the first gate line and the second gate line; connecting the third M0 metal segment to the first gate line and the M1 metal line; forming a first gate cut on the first gate line between the second and third M0 metal segments; and forming a second gate cut on the second gate line between the first and second M0 segments.

Claims20

Dependent claims

A method comprising:

forming first and second vertical gate lines, spaced from and parallel to each other;
forming a metal 1 (M1) metal line parallel to and between the first and second gate lines;
forming first, second, and third metal 0 (M0) metal segments perpendicular to the M1 metal line;
connecting the first M0 metal segment to the M1 metal line and the second gate line;
connecting the second M0 metal segment to the first gate line and the second gate line;
connecting the third M0 metal segment to the first gate line and the M1 metal line;
forming a first gate cut on the first gate line between the second and third M0 metal segments;
and
forming a second gate cut on the second gate line between the first and second M0 metal segments.

6 more elements

A method comprising:

forming first and second active areas on a substrate at top and bottom sides of a cell and separated from each other;
forming first and second power rails at top and bottom sides of the first and second active areas, respectively;
forming first, second, third, fourth, fifth, sixth, seventh, and eighth vertical gate lines, spaced from and parallel to each other, extending between the top and bottom sides of the cell;
forming first, second, third, fourth, fifth, sixth, and seventh equally spaced metal 1 (M1) metal lines parallel to and between consecutive adjacent pairs of the first through eighth gate lines, respectively, and extending between the first and second active areas;
forming first, second, and third metal 0 (M0) metal segments perpendicular to the M1 metal lines, between the first and second active areas and vertically spaced from each other with the second M0 metal segment between the first and third M0 metal segments;
forming a first via (V0) between the first M0 metal segment and the fourth M1 metal line and a first gate contact (CB) between the fifth gate line and the first M0 metal segment;
forming second and third CB's between the second M0 metal segment and the fourth and fifth gate lines, respectively;
forming a fourth CB between the fourth gate line and the third M0 metal segment and a second V0 between the third M0 metal segment and the third M1 metal line;
forming a first gate cut on the fourth gate line between the second and third M0 metal segments;
forming a second gate cut on the fifth gate line between the first and second M0 metal segments;
and
forming gridded M1 power tabs connected to the first and second power rails.

9 more elements

Dependencies are inferred from the claim text.

MOL architecture enabling ultra-regular cross couple

Life of this patent

MOL architecture enabling ultra-regular cross couple

Life of this patent

Abstract

Claims20