Back to results
US 9,431,295 B2Granted
Interconnect structure including a modified photoresist as a permanent interconnect dielectric and method of fabricating same
AssigneeGlobalfoundries Inc.
InventorQinghuang Lin
Life of this patent
Estimating the term…
Abstract
An interconnect structure is provided that may include at least one cured permanent patterned dielectric material located on a surface of a substrate. The at least one cured permanent patterned dielectric material is a cured product of a patterned photoresist that includes a dielectric enabling element therein. The structure further includes at least one conductively filled region embedded within the at least one cured permanent patterned dielectric material.
Claims20
An interconnect structure comprising:
- a patterned antireflective coating located on a substrate;
- a first cured permanent patterned dielectric material located on said patterned antireflective coating;
- and
- at least one conductively filled region embedded within said first cured permanent patterned dielectric material,
- wherein said first cured permanent patterned dielectric material is a cured product of a first patterned photoresist.
2 more elements
An interconnect structure comprising:
- a patterned antireflective coating located on a substrate;
- a first cured permanent patterned dielectric material located on said patterned antireflective coating;
- a second cured permanent patterned dielectric material located atop the first cured permanent patterned dielectric material, wherein said first and second cured permanent patterned dielectric materials are cured products of first and second patterned photoresists, respectively;
- and
- a conductive region embedded within the first and second cured permanent patterned dielectric materials.
2 more elements
An interconnect structure comprising:
- a patterned antireflective coating located on a substrate;
- and
- a cured permanent patterned dielectric material located on said patterned antireflective coating, wherein said cured permanent patterned dielectric material is a cured product of a patterned photoresist.
Dependencies are inferred from the claim text.