US 9,431,247 B2Granted

Method for ion implantation

AssigneeAdvanced Ion Beam Technology, Inc.

InventorsZhimin Wan, Kourosh Saadatmand, Wilhelm P. Platow, Ger-Pin Lin, Ching-I Li, Rekha Padmanabhan, Gary N. Cai

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Abstract

A method for an ion implantation is provided. First, a non-parallel ion beam is provided. Thereafter, a relative motion between a workpiece and the non-parallel ion beam, so as to enable each region of the workpiece to be implanted by different portions of the non-parallel ion beam successively. Particularly, when at least one three-dimensional structure is located on the upper surface of the workpiece, both the top surface and the side surface of the three-dimensional structure may be implanted properly by the non-parallel ion beam when the workpiece is moved across the non-parallel ion beam one and only one times. Herein, the non-parallel ion beam can be a divergent ion beam or a convergent ion beam (both may be viewed as the integrated divergent beam), also can be generated directly from an ion source or is modified from a parallel ion beam, a divergent ion beam or a convergent ion beam.

Claims14

Dependent claims

A method for an ion implantation, comprising:

providing a non-parallel ion beam;
and
generating a relative motion between a workpiece and the non-parallel ion beam, so as to enable each region of the workpiece to be implanted by different portions of the non-parallel ion beam successively;
wherein the non-parallel ion beam is a divergent ion beam or a convergent ion beam;
wherein the step for providing the non-parallel ion beam comprises:
providing an ion beam;
and
modifying the ion beam into the non-parallel ion beam;
wherein the ion beam is a parallel ion beam, a divergent ion beam or a convergent ion beam;
wherein the step for modifying the ion beam into the non-parallel ion beam comprises at least one of the following:
using at least an optical component to diverge the ion beam into the non-parallel ion beam as a divergent ion beam;
using at least an optical component to converge the ion beam into the non-parallel ion beam as a convergent ion beam;
using at least an optical component to converge the ion beam into a convergent ion beam, so as to enable the convergent ion beam to form the non-parallel ion beam as a divergent ion beam after focusing;
using at least a first optical component to converge the ion beam into a convergent ion beam, and further using at least a second optical component to diverge the convergent ion beam into the non-parallel ion beam as a convergent ion beam;
using at least a first optical component to converge the ion beam into a convergent ion beam, and further using at least a second optical component to diverge the convergent ion beam into the non-parallel ion beam as a divergent ion beam;
using at least a first optical component to converge the ion beam into a convergent ion beam, and further using at least a second optical component to converge the convergent ion beam into the non-parallel ion beam as a convergent ion beam;
using at least a first optical component to diverge the ion beam into a divergent ion beam, and further using at least a second optical component to converge the divergent ion beam into the non-parallel ion beam as a convergent ion beam;
using at least a first optical component to diverge the ion beam into a divergent ion beam, and further using at least a second optical component to converge the divergent ion beam into the non-parallel ion beam as a divergent ion beam;
using at least a first optical component to diverge the ion beam into a divergent ion beam, and further using at least a second optical component to diverge the divergent ion beam into the non-parallel ion beam as a divergent ion beam;
and
using at least a first optical component to diverge the ion beam into a divergent ion beam, and further using at least a second optical component to converge the divergent ion beam into a convergent ion beam, so as to enable the convergent ion beam to form the non-parallel ion beam as a divergent ion beam after focusing.

18 more elements

A method for implantation, comprising:

providing an integrated ion beam;
and
directing the integrated ion beam into a workpiece having at least two three-dimensional structures;
wherein the integrated ion beam consisting of various implant angle distribution;
wherein the integrated ion beam is modified into a non-parallel ion beam by at least one of the following steps:
using at least an optical component to diverge the integrated ion beam into the non-parallel ion beam as a divergent ion beam;
using at least an optical component to converge the integrated ion beam into the non-parallel ion beam as a convergent ion beam;
using at least an optical component to converge the integrated ion beam into a convergent ion beam, so as to enable the convergent ion beam to form the non-parallel ion beam as a divergent ion beam after focusing;
using at least a first optical component to converge the integrated ion beam into a convergent ion beam, and further using at least a second optical component to diverge the convergent ion beam into the non-parallel ion beam as a convergent ion beam;
using at least a first optical component to converge the integrated ion beam into a convergent ion beam and further using at least a second optical component to diverge the convergent ion beam into the non-parallel ion beam as a divergent ion beam;
using at least a first optical component to converge the integrated ion beam into a convergent ion beam and further using at least a second optical component to converge the convergent ion beam into the non-parallel ion beam as a convergent ion beam;
using at least a first optical component to diverge the integrated ion beam into a divergent ion beam, and further using at least a second optical component to converse the divergent ion beam into the non-parallel ion beam as a convergent ion beam;
using at least a first optical component to diverge the integrated ion beam into a divergent ion beam and further using at least a second optical component to converge the divergent ion beam into the non-parallel ion beam as a divergent ion beam;
using at least a first optical component to diverge the integrated ion beam into a divergent ion beam, and further using at least a second optical component to diverge the divergent ion beam into the non-parallel ion beam as a divergent ion beam;
and
using at least a first optical component to diverge the integrated ion beam into a divergent ion beam, and further using at least a second optical component to converge the divergent ion beam into a convergent ion beam, so as to enable the convergent ion beam to form the non-parallel ion beam as a divergent ion beam after focusing.

13 more elements

Dependencies are inferred from the claim text.

Facts

Application: 14/752,522Filed 26 Jun 2015
Priority: TW 103138995 A11 Nov 2014
Published: US 2016/0133469 A112 May 2016
Granted: 30 Aug 2016
Term ends: Not estimatedThe source records don’t support an estimate.

Classification11 codes

H10P 30/222
Into semiconductor materials, e.g. for doping: characterised by the angle between the ion beam and the crystal planes or the main crystal surface
H01J 37/3171
For changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation: for ion implantation
H10D 30/0241
Of fin field-effect transistors [FinFET]: doping of vertical sidewalls, e.g. using tilted or multi-angled implants
H01J 37/3026
Program control: patterning strategy