Extremely low resistance materials and methods for modifying or creating same
AssigneeAmbature, Inc.
InventorDouglas J. Gilbert
Life of this patent
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Abstract
In some implementations of the invention, existing extremely low resistance materials (“ELR materials”) may be modified and/or new ELR materials may be created by enhancing (in the case of existing ELR materials) and/or creating (in the case of new ELR materials) an aperture within the ELR material such that the aperture is maintained at increased temperatures so as not to impede propagation of electrical charge there through. In some implementations of the invention, as long as the propagation of electrical charge through the aperture remains unimpeded, the material should remain in an ELR state; otherwise, as the propagation of electrical charge through the aperture becomes impeded, the ELR material begins to transition into a non-ELR state.
Claims14
A method comprising:
- layering a modifying material with an ELR material to form a modified ELR material, the ELR material having a crystalline structure with at least one aperture formed therein, wherein the at least one aperture facilitates propagation of electrical charge in an ELR state through the crystalline structure and in a direction parallel to an a-axis of the crystalline structure, and wherein the modified ELR material has an aperture that is maintained at temperatures greater than the at least one aperture of the ELR material.
Dependencies are inferred from the claim text.