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US 9,430,109 B2Granted
Touch screen panel and method for manufacturing the same, and display device
AssigneeBoe Technology Group Co., Ltd.
InventorsGuangye Hao, Yunsik Im
Life of this patent
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Abstract
The present invention discloses a touch Screen panel and a method for manufacturing the same, and a display device. The method comprises: forming a pattern of a touch electrode layer on a substrate; forming a pattern of an insulating layer on the touch electrode layer; and then forming the patterns of a bridging layer and a peripheral wiring on the insulating layer by one patterning process. In the invention, the patterning of the bridging layer and the peripheral wiring is accomplished simultaneously in one patterning process, thereby the number of patterning times during the manufacture process can be reduced, the manufacture efficiency of the touch screen panel can be improved, and the production cost can be lowered.
Claims11
A method for manufacturing a touch screen panel, comprising:
- forming a pattern of a touch electrode layer on a substrate, wherein the touch electrode layer comprises a touch sensing electrode and a touch driving electrode that are formed crosswise and insulated from each other;
- forming a pattern of an insulating layer on the touch electrode layer;
- and
- forming patterns of a bridging layer and a peripheral wiring on the insulating layer by one patterning process, wherein the bridging layer bridges the adjacent touch driving electrodes or the adjacent touch sensing electrodes;
- wherein, before the step of forming a pattern of an insulating layer on the touch electrode layer, the method further comprises:
- forming simultaneously by one patterning process the pattern of the touch electrode layer and a pattern of the shielding layer between the touch electrode layer and the insulating layer;
- wherein, the step of forming patterns of a bridging layer and a peripheral wiring on the insulating layer by one patterning process comprises:
- forming a thin film of the bridging layer and a thin film of the peripheral wiring in turn on the insulating layer;
- forming a photoresist on the thin film of the peripheral wiring, exposing the photoresist through a mask and developing the photoresist, and obtaining a photoresist completely-removed region, a photoresist partially-reserved region and a photoresist completely-reserved region, wherein the photoresist partially-reserved region corresponds to a pattern region that forms the bridging layer, and the photoresist completely-reserved region corresponds to a pattern region that forms the peripheral wiring;
- and
- etching the photoresist completely-removed region, the photoresist partially-reserved region and the photoresist completely-reserved region respectively and forming the patterns of the bridging layer and the peripheral wiring.
8 more elements
A touch screen panel, comprising:
- a substrate;
- and a touch electrode layer, an insulating layer, a bridging layer and a peripheral wiring that are stacked in turn on the substrate;
- wherein:
- the touch electrode layer, the insulating layer and the bridging layer are located in a touch region and a non-touch region of the touch screen panel, wherein the touch electrode layer comprises a touch sensing electrode and a touch driving electrode that are formed crosswise on the same layer and insulated from each other, and the bridging layer bridges the adjacent touch driving electrodes or the adjacent touch sensing electrodes;
- and
- the peripheral wiring is located in the non-touch region of the touch screen panel;
- wherein the touch screen panel further comprises a shielding layer which is located in the non-touch region of the touch screen panel;
- wherein the shielding layer is located between the substrate and the touch electrode layer or between the touch electrode layer and the insulating layer and
- wherein the pattern of the touch electrode layer and a pattern of the shielding layer is formed simultaneously by one patterning process;
- wherein, the patterns of a bridging layer and a peripheral wiring on the insulating layer are formed by one patterning process comprises:
- a thin film of the bridging layer and a thin film of the peripheral wiring are formed in turn on the insulating layer;
- a photoresist formed on the thin film of the peripheral wiring, exposing the photoresist through a mask and developing the photoresist, and obtaining a photoresist completely-removed region, a photoresist partially-reserved region and a photoresist completely-reserved region, wherein the photoresist partially-reserved region corresponds to a pattern region that forms the bridging layer, and the photoresist completely-reserved region corresponds to a pattern region that forms the peripheral wiring;
- and
- the photoresist completely-removed region, the photoresist partially-reserved region and the photoresist completely-reserved region etched respectively and formed the patterns of the bridging layer and the peripheral wiring.
11 more elements
Dependencies are inferred from the claim text.