Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and photomask using patterned substrate of self-organizing material

A method for performing micro fabrication, comprising:

• forming, on a substrate soluble in an organic solvent,
• an immobilization layer containing a binding material having an ability of binding with a self-organizing material having a self-organizing ability;
• transferring a protrusion and recess pattern of a mold to the immobilization layer by thermocycle nanoimprinting lithography or optical nanoimprinting lithography;
• supplying the self-organizing material to a surface of the immobilization layer on which the protrusion and recess pattern has been transferred, and
• immobilizing the self-organizing material in a recess portion of the protrusion and recess pattern of the immobilization layer, so as to obtain a self-organizing material-patterned substrate soluble in an organic solvent;
• and
• performing, by radiating light, reduced projection of a pattern of the self-organizing material-patterned substrate used as a photomask on a photoresist applied on a silicon substrate, and transferring or reprinting the pattern of the photomask on the photoresist, so as to perform micro fabrication,
• the self-organizing material being a nucleic acid, and
• the immobilization layer, to which the protrusion and recess pattern of the mold has been transferred, containing the binding material at a bottom surface and a side surface of the recess portion formed by the thermocycle nanoimprinting lithography or the optical nanoimprinting lithography.