Coating compositions for use with an overcoated photoresist
AssigneeRohm and Haas Electronic Materials LLC
InventorsAnthony Zampini, Gerald B. Wayton
Life of this patent
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Abstract
Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.
Claims7
A method of treating a microelectronic substrate, comprising:
- applying an antireflective coating composition on the substrate, the coating composition comprising a first resin that comprises anhydride groups and a second resin that is distinct from the first resin and comprises hydroxyl groups, wherein the first and second resins are acrylate resins;
- and
- applying a photoresist composition layer above the antireflective composition layer.
Dependencies are inferred from the claim text.