Positive resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Koji Hasegawa
Life of this patent
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Abstract
A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of caramel furanone ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
Claims8
A positive resist composition comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units (a) having a caramel furanone ester, represented by the general formula (1), and having a weight average molecular weight of 1,000 to 500,000 as a base resin,
- wherein R1 is hydrogen or methyl, R2 is methyl or ethyl, and X is a single bond, a C1-C12 linking group having an ester radical, ether radical or lactone ring, phenylene group or naphthylene group.
Dependencies are inferred from the claim text.