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US 9,429,841 B2Granted
Resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsKoji Ichikawa, Takashi Hiraoka, Hiromu Sakamoto
Life of this patent
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Abstract
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, m and Z1+ are defined in the specification.
Claims9
A resist composition comprising:
- a resin consisting of a structural unit represented by the formula (I), or consisting of the structural unit represented by the formula (I) and one or both of a structural unit represented by the formula (III-1) and a structural unit represented by the formula (III-2),
- a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and
- an acid generator represented by the formula (II),
- wherein R1 represents a hydrogen atom or a methyl group;
- A1 represents a C1 to C6 alkanediyl group;
- A13 represents a C1 to C18 divalent aliphatic hydrocarbon group that has one or more halogen atoms;
- X12 represents *—CO—O— or *—O—CO—, * represents a bond to A13;
- A14 represents a C1 to C17 aliphatic hydrocarbon group that optionally has one or more halogen atoms;
- wherein R11 represents a hydrogen atom or a methyl group;
- A11 represents a C1 to C6 alkanediyl group;
- R12 represents a C1 to C10 hydrocarbon group having a fluorine atom,
- wherein R21 represents a hydrogen atom or a methyl group;
- ring W2 represents a C6 to C10 hydrocarbon ring;
- A22 represents —O—, *—CO—O— or *—O—CO—, * represents a bond to ring W2;
- R22 represents a C1 to C6 alkyl group having a fluorine atom,
- wherein Rb1 and Rb2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
- Lb1 represents a C1 to C17 divalent saturated hydrocarbon group, one or more —CH2—contained in the saturated hydrocarbon group may be replaced by —O— or —CO—;
- ring Wb1 represents a C2 to C36 heterocycle;
- Rb3 represents a hydrogen atom or a C1 to C12 hydrocarbon group, one or more —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—;
- Rb4 in each occurrence independently represent a C1 to C6 hydrocarbon group, one or more —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—;
- m represents an integer of 0 to 6;
- and
- Z1+ represents an organic cation.
20 more elements
Dependencies are inferred from the claim text.