Acoustically-monitored semiconductor substrate processing systems and methods

A method of monitoring a semiconductor processing system, comprising:

• providing a process chamber adapted to carry out a process on a substrate, a process fluid source supplying a process fluid, a fluid conduit coupling the process fluid source to the process chamber, and a flow control valve located along the fluid conduit and adapted to be operable to control a flow of the process fluid from the process fluid source to the process chamber;
• and
• monitoring acoustic energy from one or more acoustic sensors operatively coupled to at least one of:
• the process fluid source,
• the fluid conduit, and
• the flow control valve.

A semiconductor substrate processing system, comprising:

• a process chamber adapted to carry out a process on a substrate;
• a fluid conduit providing a flow of a process fluid to the process chamber;
• a flow control valve located along the fluid conduit and adapted to be operable to control a flow of the process fluid to the process chamber;
• one or more acoustic sensors operable to sense acoustic energy coupled to at least one of:
• the fluid conduit, and
• the flow control valve;
• and
• an acoustic processor adapted to receive at least one signal from the one or more acoustic sensors.