Transparent conductive film, method for production thereof and touch panel therewith
AssigneeNitto Denko Corporation
InventorsTomotake Nashiki, Hideo Sugawara
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Abstract
There is provided a transparent conductive film having a transparent conductor layer with a high level of pen input durability and high-temperature, high-humidity reliability. The transparent conductive film of the present invention is a transparent conductive film, comprising: a transparent film substrate; a transparent conductor layer that is provided on one side of the transparent film substrate and has a thickness d of 15 nm to 35 nm and an average surface roughness Ra of 0.37 nm to 1 nm; and at least a single layer of an undercoat layer interposed between the transparent film substrate and the transparent conductor layer.
Claims10
A transparent conductive film, comprising:
- a transparent film substrate;
- a transparent conductor layer that is provided on one side of the transparent film substrate and has a thickness d of 15 nm to 35 nm and an average surface roughness Ra of 0.37 nm to 1 nm;
- at least a single layer of an undercoat layer interposed between the transparent film substrate and the transparent conductor layer;
- wherein the transparent conductor layer has a maximum surface roughness Ry of 7.5 nm to 15 nm,
- wherein in the transparent conductor layer, the ratio (Ry/d) of the maximum surface roughness Ry to the thickness d is from 0.34 to 1;
- and
- wherein in the transparent conductor layer, the ratio (Ra/d) of the average surface roughness Ra to the thickness d is from 0.017 to 0.045.
Dependencies are inferred from the claim text.