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US 9,428,485 B2Granted
Salt, photoresist composition and method for producing photoresist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Yuichi Mukai
Life of this patent
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Abstract
A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A1 represents a C1-C30 monovalent organic group, X1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group, m1 and m2 independently each represent an integer of 1 to 4, and Z+ represents an organic cation.
Claims9
A photoresist composition, which comprises a salt represented by formula (I):
- wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group,
- A1 represents a C3-C30 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group or a halogen group and in which a methylene group may be replaced by an oxygen atom, a sulfonyl group or a carbonyl group,
- X1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group,
- m1 and m2 independently each represent an integer of 1 to 4, and
- Z+ represents an organic cation,
- a resin which is hardly soluble or insoluble but soluble in an aqueous alkali solution by action of an acid, and
- a resin having a structural unit represented by formula (FI):
- wherein RF1 represents a hydrogen atom or a methyl group,
- AF1 represents a C1-C6 alkanediyl group, and
- RF2 represents a C1-C10 hydrocarbon group having a fluorine atom.
7 more elements
Dependencies are inferred from the claim text.