Peeling apparatus and stack manufacturing apparatus
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsMasakatsu Ohno, Hiroki Adachi, Satoru Idojiri, Koichi Takeshima
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AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsMasakatsu Ohno, Hiroki Adachi, Satoru Idojiri, Koichi Takeshima
Estimating the term…
The yield of a peeling process is improved. A peeling apparatus includes a structure body with a convex surface and a stage with a supporting surface which faces the convex surface. The structure body can hold a first member of a process member between the convex surface and the supporting surface. The stage can hold a second member of the process member. The radius of curvature of the convex surface is less than the radius of curvature of the supporting surface. The linear velocity of the convex surface is greater than or equal to the speed of a rotation center of the structure body passing the stage. The first member is wound along the convex surface to be separated from the second member.
A peeling apparatus comprising:
A peeling apparatus comprising:
Dependencies are inferred from the claim text.