Back to results
US 9,427,388 B2Granted
Cleansing agent composition comprising sulfonate-type surfactant and/or sulfate-type anionic surfactant and heterocyclic compound
AssigneeAjinomoto Co., Inc.
InventorMasahiro Ino
Life of this patent
Estimating the term…
Abstract
A cleansing agent composition containing (A) a sulfonate-type surfactant and/or a sulfate-type anionic surfactant, and (B) a heterocyclic compound represented by the formula (1) wherein R1 and R2 are each independently a hydrogen atom, a methyl group, a hydroxymethyl group, or a hydroxyethyl group, shows high detergency and low irritativeness, can suppress rough skin after washing and drying, and can be preferably used for cosmetic agents.
Claims20
A cleansing agent composition, comprising:
- (A) at least one surfactant selected from the group consisting of a sulfonate surfactant, a sulfate anionic surfactant, and a mixture thereof;
- and
- (B) at least one heterocyclic compound represented by formula (1):
- wherein R1 and R2 are each independently a hydrogen atom, a methyl group, a hydroxymethyl group, or a hydroxyethyl group.
1 more element
Dependencies are inferred from the claim text.