Non-volatile resistance-switching thin film devices
AssigneeThe Trustees of the University of Pennsylvania
InventorsI-Wei Chen, Xiang Yang
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Abstract
Disclosed herein are resistive switching devices having, e.g., an amorphous layer comprised of an insulating aluminum-based or silicon-based material and a conducting material. The amorphous layer may be disposed between two or more electrodes and be capable of switching between at least two resistance states. Circuits and memory devices including resistive switching devices are also disclosed, and a composition of matter involving an insulating aluminum-based or an silicon-based material and a conducting material. Also disclosed herein are methods for switching the resistance of an amorphous material.
Claims9
A resistive device, comprising:
- at least one amorphous layer, each amorphous layer comprising:
- a composition comprising:
- an electrically insulating aluminum-containing composition,
- wherein the electrically insulating aluminum-containing composition comprises an aluminum-containing species AlOwNz, termed Al(O,N), wherein w is from 0 to 1.5 and z=1−2w/3 is from 0 to 1;
- and
- an electrically conducting composition,
- wherein the electrically conducting composition comprises a metal M, wherein M comprises Pt, Pd, Ni, W, Au, Ag, Cu, Al, Rh, Re, Ir, Os, Ru, Nb, Ti, Zr, Hf, V, Ta, Cr, Mo, Mn, Tc, Fe, Co, Zn, Ga, In, Cd, Hg, TI, Sn, Pb, Sb, Bi, Be, Mg, Ca, Sr, Ba, Li, Na, K, Rb, Cs, a conducting metal (Me) nitride, MeNx, a conducting metal (Me) silicide, MeSix, or any combination thereof, wherein x is in the range of from about 0.5 to about 3, and
- wherein the electrically conducting composition comprises from about 1 percent to about 40 percent by molar percentage of the amorphous layer, wherein the molar percentage of the electrically conducting composition is defined as (% M +% Me) / (% Al +% M +% Me) ×100, wherein Al is from the electrically insulating aluminum-containing composition;
- and
- at least two electrodes in electrical contact with one another via the amorphous layer.
A resistive device, comprising:
- at least one amorphous layer, each amorphous layer comprising:
- a composition comprising:
- an electrically insulating aluminum-containing composition,
- wherein the electrically insulating aluminum-containing composition comprises one or more of Al2O3, or AlN;
- and
- an electrically conducting composition,
- wherein the electrically conducting composition comprises a metal M, wherein M comprises Pt, Pd, Ni, W, Au, Ag, Cu, Al, Rh, Re, Ir, Os, Ru, Nb, Ti, Zr, Hf, V, Ta, Cr, Mo, Mn, Tc, Fe, Co, Zn, Ga, In, Cd, Hg, TI, Sn, Pb, Sb, Bi, Be, Mg, Ca, Sr, Ba, Li, Na, K, Rb, Cs, a conducting metal (Me) nitride, MeNx, a conducting metal (Me) silicide, MeSix, or any combination thereof, wherein x is in the range of from about 0.5 to about 3, and
- wherein the electrically conducting composition comprises from about 1 percent to about 40 percent by molar percentage of the amorphous layer, wherein the molar percentage of the electrically conducting composition is defined as (% M +% Me)/(% Al +% M +% Me) ×100, wherein Al is from the electrically insulating aluminum-containing composition;
- and
- at least two electrodes in electrical contact with one another via the amorphous layer.
Dependencies are inferred from the claim text.