Display array substrate and manufacturing method thereof
AssigneeHon Hai Precision Industry Co., Ltd.
InventorsPo-Li Shih, Yi-Chun Kao
Life of this patent
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Abstract
A manufacturing method of display array substrate is provided. The method includes depositing a first metal layer on a substrate and defining a peripheral area and a display area, coating a photo-resist layer on the first metal layer located in the peripheral area, anodizing the first metal layer to a first metal oxide layer with the photo-resist layer as a mask, patterning the first metal oxide layer located in the display area to a gate insulator, removing the photo-resist layer to expose the first metal layer in the peripheral area, forming a channel layer on the gate insulator, and depositing a second metal layer and patterning the second metal layer located in the display area to form a source electrode and a drain electrode.
Claims17
A manufacturing method of a display array substrate, comprising:
- providing a substrate having a display area and a peripheral area;
- depositing a first metal layer on the substrate;
- coating a photo-resist layer on a portion of the first metal layer located in the peripheral area;
- anodizing the first metal layer to form a first metal oxide layer by utilizing the photo-resist layer as a mask, wherein the first metal oxide layer in the display area forms a gate insulator and the first metal oxide layer in the peripheral area forms a first insulation layer;
- removing the photo-resist layer to expose the first metal layer in the peripheral area;
- forming a channel layer on the gate insulator;
- and
- depositing a second metal layer in a pattern to form a source electrode and a drain electrode in the display area, and form a pad electrode in the peripheral area.
A manufacturing method for forming a display, comprising:
- providing a substrate having a display area and a peripheral area;
- depositing a first metal layer on the substrate having sections in the display area and the peripheral area;
- coating a photo-resist layer on a first portion of the first metal layer located in the peripheral area;
- anodizing the first metal layer to form a first metal oxide layer except at the first portion of the first metal layer coated by the photoresist layer, wherein said photoresist layer acts as a mask during the anodizing, the first metal oxide layer in the display area forms a gate insulator and the first metal oxide layer in the peripheral area forms a first insulation layer;
- removing the photo-resist layer to expose the first portion of first metal layer in the peripheral area;
- forming a channel layer on the gate insulator;
- and
- depositing a second metal layer over the gate insulator in a pattern to form a source electrode and a drain electrode on the channel layer and the gate insulator, and depositing a second metal layer over the first insulation layer to form a pad electrode.
Dependencies are inferred from the claim text.