Array substrate and method for manufacturing the same, display device

A method for manufacturing an array substrate, the method comprising following steps:

• forming patterns of a thin film transistor structure and a passivation layer on a base substrate to define a plurality of pixel units on the base substrate;
• forming patterns of the transflective layer and the color filter in a pixel region of the pixel units such that the color filter is disposed above the transflective layer;
• and
• forming an OLED in the pixel region of the pixel units so that the transflective layer and the color filter are disposed between a second electrode of the OLED and the thin film transistor structure;
• wherein the thin film transistor structure comprises a first gate and a second gate formed on the base substrate, a gate insulation layer formed over the first gate and the second gate, a first active layer and a second active layer formed on the gate insulation layer, a first source and a first drain formed on the first active layer, a second source and a second drain formed on the second active layer, the first drain being connected to the second gate, the first gate, the gate insulation layer, the first active layer, the first source and the first drain constituting a switching thin film transistor, the second gate, the gate insulation layer, the second active layer, the second source and the second drain constituting a driving thin film transistor;
• the second drain of the driving thin film transistor and the first electrode of the OLED are electrically connected;
• and
• wherein the transflective layer is separate and non-electrically connected with the first electrode.