Electrostatic discharge devices and methods of manufacture
AssigneeInternational Business Machines Corporation
InventorsHuiming Bu, Junjun Li, Theodorus E. Standaert, Tenko Yamashita
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Abstract
Electrostatic discharge (ESD) devices and methods of manufacture are provided. The method includes forming a plurality of fin structures and a mesa structure from semiconductor material. The method further includes forming an epitaxial material with doped regions on the mesa structure and forming gate material over at least the plurality of fin structures. The method further includes planarizing at least the gate material such that the gate material and the epitaxial material are of a same height. The method further includes forming contacts in electrical connection with respective ones of the doped regions of the epitaxial material.
Claims9
A structure comprising:
- a mesa structure composed of silicon on insulator material;
- a fin region separate from the mesa structure with a plurality of fin structures composed of the silicon on insulator material;
- epitaxial material on the mesa structure;
- and
- a gate material over the plurality of fin structures, wherein the gate material and the epitaxial material on the mesa structure are of a same height.
Dependencies are inferred from the claim text.