Back to results
US 9,399,228 B2Granted
Method and apparatus for purging and plasma suppression in a process chamber
AssigneeNovellus Systems, Inc.
InventorsPatrick Breiling, Kevin Gerber, Jennifer O'Loughlin, Nagraj Shankar, Pramod Subramonium
Life of this patent
Estimating the term…
Abstract
A substrate processing system includes a showerhead that comprises a head portion and a stem portion and that delivers precursor gas to a processing chamber. A baffle includes a base portion having an outer diameter that is greater than an outer diameter of the head portion of the showerhead, that comprises a dielectric material and that is arranged between the head portion of the showerhead and an upper surface of the processing chamber.
Claims8
A substrate processing system, comprising:
- a showerhead that comprises a head portion and a stem portion and that delivers precursor gas to a processing chamber;
- a baffle that includes a base portion having an outer diameter that is greater than an outer diameter of the head portion of the showerhead,
- wherein the baffle comprises a dielectric material and is arranged (i) above the head portion of the showerhead, (ii) between the head portion of the showerhead and an upper surface of the processing chamber,
- wherein the baffle defines (i) a volume between the baffle and the upper surface of the processing chamber and (ii) a gap between an outer edge of the baffle and sidewalls of the processing chamber,
- wherein the gap between the outer edge of the baffle and the sidewalls of the processing chamber is smaller than a gap between an outer edge of the showerhead and the sidewalls of the processing chamber,
- wherein the gap between the outer edge of the baffle and the sidewalls of the processing chamber extends from the outer edge of the baffle to the sidewalls, and wherein no structure is arranged in the gap between the outer edge of the baffle and the sidewalls of the processing chamber, and
- wherein no structure is arranged in the gap between the outer edge of the showerhead and the sidewalls of the processing chamber;
- and
- one or more purge gas inlets arranged in the upper surface of the processing chamber to supply purge gas downward into the volume defined between the baffle and the upper surface of the processing chamber.
6 more elements
A substrate processing system, comprising:
- a showerhead that comprises a head portion and a stem portion and that delivers precursor gas to a processing chamber;
- a baffle that includes a base portion having an outer diameter that is greater than an outer diameter of the head portion of the showerhead,
- wherein the baffle comprises a dielectric material and is arranged (i) above the head portion of the showerhead, (ii) between the head portion of the showerhead and an upper surface of the processing chamber,
- wherein the baffle defines (i) a volume between the baffle and the upper surface of the processing chamber and (ii) a gap between an outer edge of the baffle and sidewalls of the processing chamber,
- wherein the gap between the outer edge of the baffle and the sidewalls of the processing chamber is smaller than a gap between an outer edge of the showerhead and the sidewalls of the processing chamber,
- wherein the qap between the outer edqe of the baffle and the sidewalls of the processing chamber extends from the outer edge of the baffle to the sidewalls, and wherein no structure is arranqed in the qap between the outer edqe of the baffle and the sidewalls of the processing chamber, and
- wherein no structure is arranged in the qap between the outer edge of the showerhead and the sidewalls of the processing chamber;
- and
- a collar that connects the showerhead to a upper surface of the processing chamber, wherein the collar includes a head portion and a stem portion, wherein:
- the baffle includes a stem portion extending from the base portion towards the upper surface of the processing chamber;
- and
- the stem portion of the baffle is arranged around the stem portion of the collar.
9 more elements
Dependencies are inferred from the claim text.