Apparatus for treating a gas in a conduit

An apparatus for treating a gas in a conduit of a substrate processing system, comprising:

• a dielectric tube to be coupled to a conduit of a substrate processing system to allow a flow of gases through the dielectric tube, wherein the dielectric tube has a conical sidewall;
• an RF coil wound about an outer surface of the conical sidewall of the dielectric tube, the RF coil having a first end to provide an RF input to the RF coil, the first end of the RF coil disposed proximate a first end of the dielectric tube and a second end disposed proximate a second end of the dielectric tube, wherein the RF coil is hollow and includes a first coolant fitting coupled to a first end of the RF coil and a second coolant fitting coupled to a second end of the RF coil;
• a first end flange coupled to a first end of the dielectric tube;
• and
• a second end flange coupled to a second end of the dielectric tube, wherein each of the first and second end flanges are configured to couple the dielectric tube in-line in a conduit.

A substrate processing system, comprising:

• a process chamber,
• an exhaust conduit coupled to the process chamber to allow a flow of exhaust gases from the process chamber;
• a vacuum pump coupled to the exhaust conduit to evacuate exhaust gases from the process chamber through the exhaust conduit;
• a dielectric tube coupled to the exhaust conduit to allow a flow of the exhaust gases through the dielectric tube, wherein the dielectric tube has a conical sidewall;
• and
• an RF coil wound about an outer surface of the conical sidewall of the dielectric tube, the RF coil having a first end to provide an RF input to the RF coil, the first end of the RF coil disposed proximate a first end of the dielectric tube and a second end disposed proximate a second end of the dielectric tube.