Back to results
US 9,368,313 B1Granted
Electronic amplifier device
AssigneeInternational Technology Center
InventorGary Elder McGuire
Life of this patent
Estimating the term…
Abstract
An integrated pressurized electronic power amplifier circuit including a plasma cathode structure and beam focusing approach leading to an electron beam, an interaction region; an input signal line for conducting an input signal into the interaction region; an output signal line for conducting an output signal from the interaction region; a collector for the electron beam; and an envelope for maintaining a pressurized ambient and a substrate for selected spatial alignment and thermal management; and wherein the plasma cathode structure generates a plasma as a source of electrons. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.
Claims24
An amplifier device comprising:
- a plasma cathode structure configured to generate a plasma as a source of electrons to form an electron beam;
- an electron beam collector;
- an interaction structure disposed between the plasma cathode structure and the electron beam collector;
- an input signal line configured to conduct an input signal into the interaction structure;
- an output signal line configured to conduct an output signal from the interaction structure;
- where the electron beam collector is configured to collect the electron beam emanating from the plasma cathode structure focused on the electron beam collector and interacting with the electromagnetic radiation passing from the input signal line to the output signal line of the interaction structure;
- an envelope surrounding the plasma cathode structure the electron beam collector and the interaction structure;
- and
- where the envelope contains a gas at a pressure greater than 100 Torr.
6 more elements
An amplifier device comprising:
- a plasma cathode structure configured to generate a plasma as a source of electrons to form an electron beam;
- an electron beam collector;
- an interaction structure disposed between the plasma cathode structure and the electron beam collector;
- an input signal line configured to conduct an input signal into the interaction structure;
- an output signal line configured to conduct an output signal from the interaction structure;
- where the electron beam collector is configured to collect the electron beam emanating from the plasma cathode structure focused on the electron beam collector and interacting with the electromagnetic radiation passing from the input signal line to the output signal line of the interaction structure;
- an envelope surrounding the plasma cathode structure, the electron beam collector and the interaction structure;
- where the envelope is configured to maintain a selected ambient pressure within;
- and
- a substrate that is coupled to the plasma cathode structure, the electron beam collector, the interaction structure, the input signal line and the output signal line to maintain spatial alignment thereof.
7 more elements
An amplifier device comprising:
- a plasma cathode structure configured to produce a plasma as a source of electrons to form an electron beam;
- an electron beam collector;
- a slow wave structure disposed between the plasma cathode structure and the electron beam collector;
- an input signal line configured to conduct an input signal into the slow wave structure;
- an output signal line configured to conduct an output signal from the slow wave structure;
- where the electron beam collector is configured to collect the electron beam emanating from the plasma cathode structure focused on the electron beam collector with the electron beam interacting with the slow wave structure;
- one or more magnetic field generators configured to focus the electron beam;
- a substrate that is coupled to the plasma cathode structure, the electron beam collector, the interaction structure, the input signal line and the output signal line to maintain spatial alignment thereof;
- an envelope surrounding the plasma cathode structure, the electron beam collector, the interaction structure;
- and
- where the envelope is configured to maintain a pressurized gas or mixture of gasses at an ambient pressure selected within the range of about 100 Torr to about 760 Torr.
8 more elements
An amplifier device comprising:
- a plasma cathode structure configured to generate a plasma as a source of electrons to form an electron beam directed at an electron beam collector;
- an interaction structure having an input and an output and being disposed between the plasma cathode structure and the electron beam collector in a manner that allows the electron beam to interact with electromagnetic radiation passing from the input to the output of the interaction structure;
- an envelope surrounding the plasma cathode structure, the electron beam collector and the interaction structure;
- and
- where the envelope is configured to maintain a selected ambient pressure between approximately greater than 100 Torr and approximately one atmosphere within.
2 more elements
Dependencies are inferred from the claim text.