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US 9,366,960 B2Granted
Negative resist composition, method of forming resist pattern, and complex
AssigneeTokyo Oha Kogyo Co., Ltd.
InventorsNaoki Yamashita, Yoshitaka Komuro, Yoshiyuki Utsumi, Daiju Shiono
Life of this patent
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Abstract
A negative resist composition including a complex represented by the general formula (1); and a polymerization initiator. in which M represents hafnium (Hf) or zirconium (Zr), X represents a ligand including a conjugate base of an acid which has an acid dissociation constant (pKa) of 3.8 or less and has a polymerizable group, Y represents a ligand having no polymerizable group, and n represents an integer of 1 to 4. [MXnY4-n] (1)
Claims10
A negative resist composition comprising:
- a complex represented by the following general formula (1):
- [MXnY4-n] (1)
- wherein M represents hafnium (Hf) or zirconium (Zr), X represents a ligand comprising a conjugate base of an acid which has an acid dissociation constant (pKa) of 3.8 or less and has a polymerizable group, Y represents a ligand having no polymerizable group, and n represents an integer of 1 to 4;
- a polymerization initiator;
- and
- an organic solvent.
3 more elements
Dependencies are inferred from the claim text.