Dual-direction chemical delivery system for ALD/CVD chambers
AssigneeApplied Materials, Inc.
InventorsZhenbin Ge, Chien-Teh Kao, Joel M. Huston, Mei Chang
Life of this patent
Estimating the term…
Abstract
Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.
Claims18
A gas distribution apparatus to control a flow of gas into a process chamber, comprising:
- a gas distribution plate having a front side and a back side;
- a gas delivery channel extending through the gas distribution plate, the delivery channel having a length defined by a first end and a second end, the delivery channel including a plurality of apertures spaced along the length extending through the gas distribution plate to the front side of the gas distribution plate;
- a gas delivery system connected to the first end and the second end of the delivery channel, the gas delivery system comprising a first inlet line in flow communication with the first end of the delivery channel and the second inlet line in flow communication with the second end of the delivery channel, a pump line, a first purge line in flow communication with the first inlet line and a second purge line in flow communication with the second inlet line;
- and
- a controller to regulate the flow of the gas through the delivery channel and into the process chamber.
A gas distribution apparatus to control a flow of gas into a process chamber, comprising:
- a gas distribution plate having a front side and a back side;
- a first gas delivery channel extending through the gas distribution plate, the first delivery channel having a length defined by a first end and a second end, the first delivery channel including a plurality of apertures spaced along the length extending through the gas distribution plate to the front side of the gas distribution plate;
- a second gas delivery channel extending through the gas distribution plate, the second delivery channel having a length defined by a third end and a fourth end, the second delivery channel including a plurality of apertures spaced along the length extending through the gas distribution plate to the front side of the gas distribution plate;
- a gas delivery system comprising a first inlet line, a second inlet line, a third inlet line, a fourth inlet line, a pump line, a first purge line, a second purge line, a third purge line and a fourth purge line, the first inlet line in flow communication with the first end of the first gas delivery channel, the second inlet line in flow communication with the second end of the first gas delivery channel, the third inlet line in flow communication with the third end of the second gas delivery channel and the fourth inlet line in flow communication with the fourth end of the second gas delivery channel, the first purge line in flow communication with the first inlet line, the second purge line in flow communication with the second inlet line, the third purge line in flow communication with the third inlet line and the fourth purge line in flow communication with the fourth inlet line;
- and
- a controller to regulate the flow of the gas through the first gas delivery channel and the second gas delivery channel and into the process chamber.
Dependencies are inferred from the claim text.