Artificial marble with transparent and amorphous pattern
AssigneeCheil Industries Inc.
InventorsDong Hee Kim, Eung Seo Park, Chang Ho Son
Life of this patent
Estimating the term…
Abstract
Artificial marble having a transparent amorphous pattern includes a base or matrix material portion and a transparent pattern portion. The pattern portion has a specific gravity or about 1.60 or more and is formed by hardening or curing a resin composition comprising a binder selected from halogenated urethane acrylates, halogenated epoxy acrylates and combinations thereof and an acrylic polymerizable monomer.
Claims10
An artificial marble having an amorphous pattern comprising a matrix and a pattern part, wherein said pattern part has a specific gravity of about 1.6 to about 2.0, and wherein said pattern part comprises a cured pattern part forming resin composition (A) comprising a binder, an acrylic polymerizable monomer, and an inorganic filler in an amount of about 0.1 to about 15 parts by weight based on about 100 parts by weight of a mixture of the binder and the acrylic polymerizable monomer.
A method for preparing an artificial marble having an amorphous pattern, the method comprising:
- mixing a polymerizable acrylic monomer with a binder comprising a halogenated urethane acrylate, halogenated epoxy acrylate or a combination of thereof and an inorganic filler in an amount of about 0.1 to about 15 parts by weight based on about 100 parts by weight of a mixture of the binder and the acrylic polymerizable monomer to prepare a pattern part forming resin composition (A) having a specific gravity of about 1.6 to about 2.0;
- dissolving polyacrylate in an acrylic monomer to prepare a matrix forming slurry (B);
- non-uniformly supplying both of the pattern forming resin composition (A) and the matrix forming slurry (B) into a molding cell;
- and
- curing the pattern part forming resin composition (A) and the matrix forming slurry (B).
Dependencies are inferred from the claim text.