Fabrication method of inverted solar cells

Abstract

A fabrication method for an inverted solar cell includes: (1) providing a growth substrate; (2) depositing a SiO2 mask layer over the surface of the growth substrate to form a patterned substrate; (3) forming a sacrificial layer with epitaxial growth over the patterned substrate, wherein the sacrificial layer encompasses the entire SiO2 mask pattern; (4) forming a buffer layer over the sacrificial layer via epitaxial growth; (5) forming a semiconductor material layer sequence of the inverted solar cell over the buffer layer with epitaxial growth; (6) bonding the semiconductor material layer sequence of the inverted solar cell with a supporting substrate; (7) selectively etching the SiO2 mask layer by wet etching; and (8) selectively etching the sacrificial layer by wet etching to lift off the growth substrate.

Dependencies are inferred from the claim text.