Thin film transistor, method of manufacturing the same, and electronic apparatus
AssigneeSony Corporation
InventorKoichi Amari
Life of this patent
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Abstract
A thin film transistor includes: a gate electrode and a pair of source and drain electrodes; and a semiconductor layer having a channel formed therein, and having a pair of connection sections connected to the pair of source and drain electrodes, respectively, wherein one or both of opposed surfaces of the pair of connection sections is a non-flat surface.
Claims11
A thin film transistor, comprising:
- a gate electrode and a pair of source and drain electrodes;
- and
- a semiconductor layer having a channel formed therein, and having a pair of connection sections connected to the pair of source and drain electrodes, respectively,
- wherein one or both of opposed surfaces of the pair of connection sections is a non-flat surface,
- wherein a cross section of each of the connection sections has a concavo-convex shape,
- wherein each of the connection sections forms a wall surface of a through-hole penetrating the entire thickness of the semiconductor layer, the entire thickness of a first insulating layer and at least a portion of thickness of a second insulating layer,
- wherein the first insulating layer is provided between the semiconductor layer and the pair of source and drain electrodes, and
- wherein the second insulating layer is provided between the semiconductor layer and the gate electrode.
A method of manufacturing a thin film transistor, the method comprising:
- forming a gate electrode on a substrate;
- forming a semiconductor layer on the substrate and the gate electrode;
- forming a first insulating layer on the semiconductor layer;
- forming a through-hole penetrating the entire thickness of the semiconductor layer, the entire thickness of the first insulating layer and at least a portion of thickness of a second insulating layer, wherein the second insulating layer is provided between the semiconductor layer and the gate electrode;
- forming a pair of connection sections having opposed surfaces one or both of which is a non-flat surface, wherein a cross section of each of the connection sections has a concavo-convex shape,
- wherein each of the connection sections forms a wall surface of the through-hole;
- and
- forming a pair of source and drain electrodes on the semiconductor layer and the first insulating layer, the source and drain electrodes being to be connected to the semiconductor layer via the connection sections.
An electronic apparatus provided with a display unit, the display unit being provided with a plurality of display devices and a plurality of thin film transistors configured to drive the display devices, each of the thin film transistors comprising:
- a gate electrode and a pair of source and drain electrodes;
- and
- a semiconductor layer having a channel formed therein, and having a pair of connection sections connected to the pair of source and drain electrodes, respectively,
- wherein one or both of opposed surfaces of the pair of connection sections is a non-flat surface,
- wherein a cross section of each of the connection sections has a concavo-convex shape,
- wherein each of the connection sections forms a wall surface of a through-hole penetrating the entire thickness of the semiconductor layer, the entire thickness of a first insulating layer and at least a portion of thickness of a second insulating layer,
- wherein the insulating layer is provided between the semiconductor layer and the pair of source and drain electrodes, and
- wherein the second insulating layer is provided between the semiconductor layer and the gate electrode.
Dependencies are inferred from the claim text.