Display device and method of manufacturing the same

A method of manufacturing a display device, the method comprising:

• forming a gate electrode and a gate pad on a substrate;
• forming a gate insulating layer on the gate electrode and the gate pad;
• forming a semiconductor layer on the gate insulating layer;
• forming a source electrode and a drain electrode on the semiconductor layer;
• forming a data pad on the gate insulating layer;
• forming a first protective layer on the source electrode, drain electrode, and data pad, and forming a second protective layer, the second protective layer structured such that a hole is formed through the second protective layer;
• forming an anti-etching layer on a portion of the first protective layer over the gate pad and the data pad;
• etching an area of the first protective layer through the hole in the second protective layer to complete a first contact hole through the first and second protective layers;
• removing the anti-etching layer;
• forming a pixel electrode on the second protective layer, the pixel electrode connected to the drain electrode through the first contact hole;
• forming a third protective layer on the pixel electrode;
• forming a sensing line on the third protective layer;
• forming a fourth protective layer on the sensing line;
• and
• forming a common electrode, connected to the sensing line, on the fourth protective layer.

A method of manufacturing a display device, the method comprising:

• forming a thin film transistor (TFT) on a substrate, the TFT comprising a gate electrode, a semiconductor layer, a source electrode, and a drain electrode;
• forming a first protective layer structured such that a first hole exists through the first protective layer exposing the drain electrode from the first protective layer;
• after the first protective layer is formed, forming a second protective layer structured such that a second hole exists through the second protective layer exposing the drain electrode from the first and second protective layers, the second hole having a different size than the first hole at a plane where the first and second protective layers contact each other;
• and
• forming a pixel electrode on the second protective layer, the pixel electrode connected to the drain electrode through the first and second holes;
• forming a third protective layer on the pixel electrode;
• forming a sensing line on the third protective layer;
• forming a fourth protective layer on the sensing line;
• and
• forming a common electrode, connected to the sensing line, on the fourth protective layer.