Substrate and assembly thereof with dielectric removal for increased post height
AssigneeTessera, Inc.
InventorsKazuo Sakuma, Philip Damberg, Belgacem Haba
Life of this patent
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AssigneeTessera, Inc.
InventorsKazuo Sakuma, Philip Damberg, Belgacem Haba
Estimating the term…
An interconnection substrate includes a plurality of electrically conductive elements of at least one wiring layer defining first and second lateral directions. Electrically conductive projections for bonding to electrically conductive contacts of at least one component external to the substrate, extend from the conductive elements above the at least one wiring layer. The conductive projections have end portions remote from the conductive elements and neck portions between the conductive elements and the end portions. The end portions have lower surfaces extending outwardly from the neck portions in at least one of the lateral directions. The substrate further includes a dielectric layer overlying the conductive elements and extending upwardly along the neck portions at least to the lower surfaces. At least portions of the dielectric layer between the conductive projections are recessed below a height of the lower surfaces.
An interconnection substrate, comprising:
A method for making a microelectronic substrate, comprising the steps of:
Dependencies are inferred from the claim text.